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Characteristics and Classification of Aluminum Alloys
In manufacturing, aluminum is one of the most popular and widely used metals. Al with light weight, strength to weight ratio is quite considerable, so it is favored characteristics. In order to meet the diverse needs of different industrial sectors, aluminum is combined with other elements to fo...Read more -
Cobalt (Co) sputtering target
Cobalt sputtering target is made of high purity cobalt. Co metal target with Excellent magnetic properties, such as high saturation magnetization. Cobalt sputtering target production process covers powder metallurgy or melting casting, which is made by multiple processes. Co target plays a signi...Read more -
What Is Permalloy ? What is the Composition, Properties, and application?
Permalloy is an alloy mainly composed of nickel and iron, the nickel content is mostly between 35% and 90%, often containing a small amount of molybdenum, copper and other elements. It has high permeability, low coercivity and good rectangular hysteresis loop characteristics, and is widely used i...Read more -
What is the production method of silicon target?
Silicon sputtering target is made of high purity silicon for sputtering coating process raw materials, silicon sputtering target has high purity characteristics, purity can reach 99.999% and above. The physical properties are stable, the density is about 2.33g/cm³, the melting point is about 1414...Read more -
Titanium Aluminum (TiAl) alloy target
Titanium-aluminum alloy target is a material used in physical vapor deposition (PVD) technology. The TiAl alloy target is an alloy of two metals, titanium (Ti) and aluminum (Al), that is made into a specific shape (usually a disk or rectangular block) for depositing thin films in a vacuum envir...Read more -
What are the advantages of sputtering target binding copper backplane
1.The sputtering target bonding copper backplane will enhanced heat dissipation : In the sputtering process, the target is bombarded by high-energy ions, which will produce a lot of heat. Copper has a very high thermal conductivity (about 400 W/m·K), which quickly conducts the heat of the silv...Read more -
Iron Fe Sputtering Target
Iron sputtering target is a target with iron as its main component. Fe target can be prepared by methods such as melting casting or powder metallurgy. Fe sputtering target has the characteristics of high purity, good electrical and thermal conductivity, and strong machinability. In the electronic...Read more -
Nickel Chromium Ni/Cr Sputtering Targets
Nickel chromium target materials have excellent antioxidant and corrosion resistance properties, adapt to a wide range of temperature changes, and are used to protect the film layer or workpiece surface. In the vacuum coating industry, NiCr alloy targets and thin films are widely used for surface...Read more -
1J85 nickel base soft magnetic alloy
1J85 Iron nickel molybdenum soft magnetic alloy is an iron nickel base alloy, mainly composed of iron, nickel and molybdenum and other elements, is a high performance magnetic material. It has excellent soft magnetic properties such as high initial permeability and low coercivity. Widely used in ...Read more -
Application field of sputtering target
In many fields of modern science and technology, sputtering targets play an indispensable role. Its unique physical properties and preparation process enable it to be widely used in several key industries. In the field of display coating, sputtering targets are mainly used to prepare thin film ma...Read more -
Classification of sputtering targets
Sputtering target is a material widely used in physical vapor deposition (PVD) technology. Sputtering target classification by Shape: Square target: The shape is square, in some specific sputtering equipment or process, the use of square target can better adapt to the shape and size of the su...Read more -
Iron cobalt nickel manganese copper alloy target
Fe-cobalt-nickel-manganous-copper alloy target is a kind of alloy material composed of iron (Fe), cobalt (Co), nickel (Ni), manganese (Mn) and copper (Cu) and other elements mixed in a certain proportion, which is widely used in sputtering coating technology. Product shape: flat target, cylindr...Read more