Newly Arrival Electron-Beam Melting - Cofev Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
Newly Arrival Electron-Beam Melting - Cofev Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Cobalt Iron Vanadium sputtering target has 52% content of Cobalt, 9%-23% content of Vanadium and the rest – ductile permanent-magnetic material. It exhibits excellent plastic deformation capacity and could be fabricated into components with complicated forms.
Cobalt Iron Vanadium alloy sputtering target has extremely high saturation flux density Bs(2.4T) and Curie temperature(980~1100℃). It can help with weight reduction and can improve stability at elevated temperatures. It is a suitable material for aviation electric appliances(small special electrical machines, electromagnet and electric relay). It also has high saturation magnetostriction coefficient, and could produce magnetostrictive transducer.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Cobalt Iron Vanadium Sputtering Materials according to Customers’ specifications. For more information, please contact us.
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We insist on offering premium quality creation with very good company concept, honest product sales along with the finest and fast assistance. it will bring you not only the premium quality item and huge profit, but the most significant is to occupy the endless market for Newly Arrival Electron-Beam Melting - Cofev Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Palestine, Portugal, New Delhi, Our tenet is "integrity first, quality best". We have confidence in providing you with excellent service and ideal products. We sincerely hope we can establish win-win business cooperation with you in the future!
By Helen from Philippines - 2017.11.11 11:41
It is a very good, very rare business partners, looking forward to the next more perfect cooperation!
By Hazel from Iraq - 2018.11.22 12:28
