Wholesale MoCu Sputtering Target High Purity Thin Film Pvd Coating Custom Made Manufacturer and Supplier

Molybdenum Copper

MoCu Sputtering Target High Purity Thin Film Pvd Coating Custom Made Featured Image

Short Description:

Category	Alloy Sputtering Target
Chemical Formula	MoCu
Composition	Molybdenum Copper
Purity	99.9%，99.95%，99.99%
Shape	Plates，Column Targets，arc cathodes，Custom-made
Production Process	PM
Available Size	L≤200mm,W≤200mm

Send email to us

Product Detail

Product Tags

Molybdenum Copper sputtering target is fabricated by means of infiltration sintering: Molybdenum powders sintered and formed into the semi-finished products, combined with a subsequent microwave-assisted aqueous solution strategy. Molybdenum Copper alloy has outstanding physical and mechanical properties: satisfactory electrical and thermal conductivity, low and adjustable coefficient of thermal expansion, wear resistance, and high temperature strength.

Compositions (%)	Cu	Mo	Impurity (%)
MoCu10	10±2	Balance	≤0.1
MoCu15	15±3	Balance	≤0.1
MoCu20	20±3	Balance	≤0.1
MoCu25	25±3	Balance	≤0.1
MoCu40	40±5	Balance	≤0.1

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Molybdenum Copper Sputtering Materials according to Customers’ specifications. For more information, please contact us.

Previous: MoNi Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Next: NbTi Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Arc Ion Plating