Inaianei kua maha ake nga kaiwhakamahi e mohio ana ki nga momo whaainga me teona tono, engari kaore pea i tino marama te wehewehenga. Inaianei meRSM miihini tohatoha ki a koeetahi whakaurunga o nga whainga pupuhi magnetron.
Te whäinga whakapoipoi: whängai whakakikorua whakarewa, whängai whakakikorua koranu, whängai whakakikorua uku, whängai whakapuru uku, whängai whakapuru uku, carbide ceramic sputtering whäinga, whängai puhoi parakaramiki, nitride ceramic sputtering whäinga, oxide ceramic punga, selenide ceramic sputtering whainga, sulfide te whainga putiki uku, te whainga karekau teluride, etahi atu whainga uku, Chromium doped silicon oxide ceramic target (CR SiO), indium phosphide target (INP), lead arsenide target (pbas), indium arsenide target (InAs).
I te nuinga o te wa ka wehewehea te pupuhi Magnetron ki nga momo e rua: te pupuhi DC me te pupuhi RF. He maamaa te kaupapa o nga taputapu pupuhi DC, he tere hoki te tere i te wa e pupuhi ana te whakarewa. Ka whakamahia nuitia te RF sputtering. I tua atu i te pupuhi i nga raraunga whakahaere, ka taea hoki te pupuhi i nga raraunga kore-whakahaere. Ka taea hoki te whakamahi i te piro pupuhi mo te reactive sputtering ki te whakarite i nga raraunga puhui penei i te waikura, nitride me te carbide. Mena ka piki te auau o te RF, ka huri te ngaruiti plasma sputtering. I tenei wa, kei te whakamahia te hikohiko hikohiko hiko (ECR) ngaruiti plasma sputtering.
Te wa tuku: Mei-26-2022