MoCu Sputtering Target High Purity Angiangi Film Pvd paninga Ritenga Hanga
Molybdenum Copper
Molybdenum Copper sputtering target is fabricated by means of infiltration sintering: Molybdenum powders sintered and made into the semi-finished products, combed with a next microwave-assisted aqueous solution. Ko te koranu Molybdenum Copper he tino pai nga ahuatanga o te tinana me te miihini: te pai o te kawe hiko me te waiariki, te iti me te whakatika whakarea o te roha waiariki, te aukati kakahu, me te kaha teitei o te pāmahana.
Tito (%) | Cu | Mo | poke (%) |
MoCu10 | 10±2 | Taurite | ≤0.1 |
MoCu15 | 15±3 | Taurite | ≤0.1 |
MoCu20 | 20±3 | Taurite | ≤0.1 |
MoCu25 | 25±3 | Taurite | ≤0.1 |
MoCu40 | 40±5 | Taurite | ≤0.1 |
Ko nga Taonga Taonga Motuhake he tohungatanga ki te Hanganga o te Sputtering Target a ka taea e ia te whakaputa Molybdenum Copper Sputtering Materials e ai ki nga whakaritenga a nga Kaihokohoko. Mo etahi atu korero, tena koa whakapiri mai ki a maatau.