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AlTa Sputtering Target High Purity Angiangi Film PVD paninga Ritenga Hanga

Konumohe-Tantalum

Whakaahuatanga Poto:

Kāwai

Whāinga Sputtering Alloy

Tātai matū

AlTa

Te tito

Konumohe-Tantalum

Maamaa

99.9%,99.95%,99.99%

Hanga

Pereti , Whangahanga Tiwae , arc cathodes , Ritenga-hanga

Tukanga Whakaputa

Korehau rewa,PM

Rahi Wātea

L≤200mm,W≤200mm


Taipitopito Hua

Tohu Hua

Ka rite nga whaainga ma te whakakotahi i nga paura Aluminium me te Tantalum me te whakarewa korehau ka whai i te whakakoi ki te kiato tonu. Ko nga mea kua oti te whakatiki ka whakahiatohia, ka hangaia kia rite ki te ahua e hiahiatia ana.

Konumohe Tantalum sputtering ūnga he parakore tiketike, microstructure ōrite me te pai conductivity. Kei te whakamahia nuitia i roto i te hanganga o nga kiriata angiangi mo te ahumahi whakaatu papatahi. Ka taea hoki te taapiri Aluminum Tantalum ki te whakaputa koranu Titanium mahi teitei hei whakapai ake i te pai o te pāmahana teitei.

Ihirangi poke o te koranu Al-Ta

titonga

Ihirangi%)

Ta

Fe

Si

C

O

AlTa60

55.0~65.0

≤0.05

≤0.02

≤0.01

≤0.05

AlTa70

65.0~75.0

≤0.05

≤0.02

≤0.01

≤0.05

Ko nga Taonga Taonga Motuhake he mea motuhake i roto i te Hanganga o te Sputtering Target a ka taea e ia te whakaputa i nga Rawa Konumohe Tantalum Sputtering e ai ki nga korero a nga Kaihokohoko. Kei a maatau hua nga ahuatanga miihini tino pai, te hanganga riterite, te mata oro me te kore wehewehe, pores, kapiti ranei. Mo etahi atu korero, tena koa whakapiri mai ki a maatau.


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