Wholesale Massive Selection for V Ingot - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Manufacturer and Supplier

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Our primary target will be to provide our clients a serious and responsible small business relationship, supplying personalized attention to all of them for Cobalt Nickel Chromium Molybdenum Sputtering Target , Indium In Sputtering Target , Aluminium Tin Copper Alsncu Sputtering Target , We always provide best quality products and excellent service for the majority of business users and traders . Warmly welcome to join us, let's innovate together, and fly dreams.

Massive Selection for V Ingot - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:

The fabrication of Chromium Aluminum Sputtering Targets comprises the following steps:

1. Powder grinding and mixing.

2. Hot isostatic pressing treatment to get semi-finished products.

3. Machining the rough chromium aluminum alloy sputtering target material to obtain the chromium aluminum alloy sputtering target material.

During the deposition process of CrAl sputtering targets, a hard Aluminium-Chrom-Nitrid (AlCrN) coating is formed. This coating shows high hardness and oxidation resistance properties even at high temperature. The cutters could run at high feeds to increase productivity and raise quality when using CNC machines.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Sputtering Materials, and other CrAl series(for example:CrAlSi，CrAlTi，CrAlZr, CrAlTa，CrAlW，CrAlY，CrAlCe，etc.) according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Chromium Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

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With a sound enterprise credit history, exceptional after-sales services and modern production facilities, we've earned an outstanding track record amongst our consumers across the whole world for Massive Selection for V Ingot - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich , The product will supply to all over the world, such as: Montreal, Iceland, Algeria, Our company is continuing to serve customers with high quality, competitive price and timely delivery. We sincerely welcome friends from all over the world to cooperate with us and enlarge our business. If you are interested in our products, please feel free to contact us. We would love to provide you with further information.

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This is a very professional and honest Chinese supplier, from now on we fell in love with the Chinese manufacturing.

By Jerry from Puerto Rico - 2017.06.29 18:55

We have been cooperated with this company for many years, the company always ensure timely delivery ,good quality and correct number, we are good partners.

By Hedda from Belgium - 2017.12.19 11:10