Low MOQ for ACETRON 99.6% High Purity Ti+Al Round Target for Vacuum/PVD Coating
Aluminum Titanium
“Control the standard by the details, show the energy by quality”. Our corporation has strived to establish a hugely efficient and stable workers team and explored an effective high quality control procedure for Low MOQ for ACETRON 99.6% High Purity Ti+Al Round Target for Vacuum/PVD Coating, Are you still wanting for a quality product that is in accordance along with your excellent organization image while expanding your solution range? Consider our quality merchandise. Your choice will prove to get intelligent!
“Control the standard by the details, show the energy by quality”. Our corporation has strived to establish a hugely efficient and stable workers team and explored an effective high quality control procedure for China ti+al target and ti target, Our company has abundant strength and possesses a steady and perfect sales network system. We wish we could establish sound business relationships with all customers from at home and abroad on the basis of mutual benefits.
The requirement of the target quality for sputter coating is higher than that of the traditional materials industry. The uniform microstructure of the target directly affects the sputtering performance. We have a completed quality management system and we select high purity raw materials and thoroughly blend them to ensure homogeneity. Aluminum Titanium alloy sputtering target is produced by means of vacuum hot pressing method.
Our Aluminum Titanium sputtering targets could provide an outstanding oxidation-resistant nitride coating, Titanium aluminum nitride (TiAlN). TiAlN is the current mainstream as a film for cutting tools, sliding parts and tribo-coatings. It has high hardness, toughness, wear resistant performance and oxidation temperature.
Our typical AlTi targets and their properties
Ti-75Al at% |
Ti-70Al at% |
Ti-67Al at% |
Ti-60Al at% |
Ti-50Al at% |
Ti-30Al at% |
Ti-20Al at% |
Ti-14Al at% |
|
Purity (%) |
99.7 |
99.7 |
99.7 |
99.7 |
99.8/99.9 |
99.9 |
99.9 |
99.9 |
Density(g/cm3) |
3.1 |
3.2 |
3.3 |
3.4 |
3.63/3.85 |
3.97 |
4.25 |
4.3 |
Grain Size(µm) |
100 |
100 |
100 |
100 |
100/- |
- |
- |
- |
Process |
HIP |
HIP |
HIP |
HIP |
HIP/VAR |
VAR |
VAR |
VAR |
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Titanium Sputtering Materials according to Customers’ specifications. We could supply a variety of geometric forms: tubes, arc cathodes, planar or custom-made, and wide proportion range of Aluminum. Our products feature excellent mechanical properties, homogeneous microstructure, polished surface with no segregation, pores or cracks. For more information, please contact us.”Control the standard by the details, show the energy by quality”. Our corporation has strived to establish a hugely efficient and stable workers team and explored an effective high quality control procedure for Low MOQ for ACETRON 99.6% High Purity Ti+Al Round Target for Vacuum/PVD Coating, Are you still wanting for a quality product that is in accordance along with your excellent organization image while expanding your solution range? Consider our quality merchandise. Your choice will prove to get intelligent!
Low MOQ for China ti+al target and ti target, Our company has abundant strength and possesses a steady and perfect sales network system. We wish we could establish sound business relationships with all customers from at home and abroad on the basis of mutual benefits.