Leading Manufacturer CrAl Planar Targets (D100*32) for PVD Coating in functional films

We take pleasure in an exceptionally excellent status between our buyers for our superb merchandise good quality, aggressive price tag and the greatest support for Leading Manufacturer CrAl Planar Targets (D100*32) for PVD Coating in functional films, Excellent excellent, competitive selling prices, prompt delivery and dependable provider are guaranteed Kindly let us know your quantity requirement under each size category so that we will inform you accordingly.
We take pleasure in an exceptionally excellent status between our buyers for our superb merchandise good quality, aggressive price tag and the greatest support for China Cral Planar Sputtering Targets and Cral Planar Targets, We are going to initiate the second phase of our development strategy. Our company regards “reasonable prices, efficient production time and good after-sales service” as our tenet. If you are interested in any of our solutions or would like to discuss a custom order, make sure you feel free to contact us. We have been looking forward to forming successful business relationships with new clients around the world in the near future.

Chronium Aluminum Silicon Sputtering Target Description

The fabrication of Chronium Aluminum Silicon Sputtering Targets comprises the following steps:
1.Vacuum melting of Silicon, Aluminum and Chronium to obtain step alloys.
2.Powder grinding and mixing.
3.Hot isostatic pressing treatment to obtain the chromium Aluminum silicon alloy sputtering target.
Chronium Aluminum Silicon Sputtering Targets are extensively used in cutting tools and molds, owing to its wear resistance and high temperature oxidation resistance to improve the film performance.
An amorphous Si3N4 phase would be formed during the process of PVD of CrAlSi targets. Due to the incorporation of amorphous Si3N4 phase, the growth of the grain size could be restrained and improve the high temperature oxidation resistance property.

Chronium Aluminum Silicon Sputtering Target Packaging

Our Chronium Aluminum Silicon sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation

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RSM’s Chronium Aluminum Silicon sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.We take pleasure in an exceptionally excellent status between our buyers for our superb merchandise good quality, aggressive price tag and the greatest support for Leading Manufacturer CrAl Planar Targets (D100*32) for PVD Coating in functional films, Excellent excellent, competitive selling prices, prompt delivery and dependable provider are guaranteed Kindly let us know your quantity requirement under each size category so that we will inform you accordingly.
Leading Manufacturer for China Cral Planar Sputtering Targets and Cral Planar Targets, We are going to initiate the second phase of our development strategy. Our company regards “reasonable prices, efficient production time and good after-sales service” as our tenet. If you are interested in any of our solutions or would like to discuss a custom order, make sure you feel free to contact us. We have been looking forward to forming successful business relationships with new clients around the world in the near future.