Wholesale NiTa Sputtering Target High Purity Thin Film Pvd Coating Custom Made Manufacturer and Supplier

Nickel Tantalum

Nita Sputtering Target High purity thin film Pvd Coating Custom made Featured Image

Brevis descriptio:

Categoria	Admisce Sutlering Target
Formulae chemica	NiTa
Compositio	Nickel tantalum
Puritas	99.9%，99.95%，99.99%
Figura	Plates，Column Targets，arc cathodes，Custom-made
Processus productionis	Vacuum Melting，PM
Available Location	L≤200mm， W≤200mm

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Nickel Tantalum Putris Scuta fabricata sunt per vacui liquefactionem vel pulveris processum metallurgicum. Magnam habet puritatem et microstructuram homogeneam.

Nickel Tantalum putris scuta late adhibentur in industria aerospace, aircraft, navigationis. Eius bona resistentia ad altae temperaturae superficiem reactivitatem trahit ex magna quantitate Tantali quae in offensionibus adest, quae altam temperaturas MMM°C liquefaciens habet. Aluminium, Yttrium, et Chronium soient addi ad emendandas possessiones.

Dives Materias Speciales speciales in Fabrica Putris Target et Nickel Tantalum Materias putris producere potuit secundum determinationes Customers. Pro maiori, pete nobis.

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