Wholesale NiCrCu Sputtering Target High Purity Thin Film Pvd Coating Custom Made Manufacturer and Supplier

Nickel Chromium Copper

NiCrCu Sputtering Target High purity thin Film Pvd Coating Custom made featured Image

Brevis descriptio:

Categoria	Admisce Sutlering Target
Formulae chemica	NiCrCu
Compositio	chromium aeneum Nickel
Puritas	99.5%，99.7%，99.9%，99.99%
Figura	Plates，Column Targets，arc cathodes，Custom-made
Processus productionis	Vacuum Melting
Available Location	L≤2000mm, W≤350mm

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NiCrCu Sputter scopo producitur ex liquefactione et jactu materiae rudis ex Nickel Chromium Copper. Magnam resistivity, frigiditatem coëfficientem et altam sensibilitatem habet. Nickel et Chromium similes energiae superficies habent, et compositio depositio cinematographici NiCrCu similis est scopae putris, ut facile depositio effectus coerceat.

Dives Materias Speciales speciales habet in Fabrica Putris Target ac Nickel Chromium Cuprum Materias Putres producere secundum Customers specificationes. Pro maiori, pete nobis.

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