Wholesale NiCrAlSi Sputtering Target High Purity Thin Film Pvd Coating Custom Made Manufacturer and Supplier

Nickel Chromium Aluminium Silicon

NiCrAlSi Sputtering Target High purity thin film Pvd Coating Custom made Featured Image

Brevis descriptio:

Categoria	Admisce Sutlering Target
Formulae chemica	NiCrAlSi
Compositio	Nickel Chromium Aluminium Silicon
Puritas	99.5%，99.9%，99.95%
Figura	Plates，Column Targets，arc cathodes，Custom-made
Processus productionis	Vacuum Melting
Available Location	L≤1500mm, W≤200mm

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Scopum NiCrAlSi Putris producit per Vacuum Liquefactum, Projectio et Curatio Hot Curatio ad altam constantiam, denique frumenti magnitudinem ac bonum faciendum.

Ob excellentem altitudinem resistentiae, boni anti-corrosionis morum, caliditas resistentiae et solidabilitatis, Nickel Chromium Aluminium Silicon offensionis late adhibetur in multis applicationibus industrialibus, inclusa metallurgia, fabricatione mechanica, et adminimenta domestica.

Dives Materias Speciales speciales in Fabrica Sputris Target et Nickel Chromium Aluminium Pii Putris Materias producere potuit secundum determinationes Customers. Pro maiori, pete nobis.

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