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AlNi Alloy Sputtering Target High purity thin film PVD Coating Custom Made

Aluminium Nickel

Brevis descriptio:

Categoria

Admisce Sutlering Target

Formulae chemica

AlNi

Compositio

Aluminium Nickel

Puritas

99.9%,99.95%,99.99%

Figura

Plates,Column Targets,arc cathodes,Custom-made

Processus productionis

Vacuum Melting,PM

Available Location

L≤200mm,W≤200mm


Product Detail

Product Tags

Aluminium Nickel scopum putris mixturae prodiit mediante vacuo liquefactione et potentia metallurgia. Miscentes Aluminium et Nickel in moles necessaria ad praebendas AlNi regulam mittendo. Dejectio regulae tunc incisa est ut formam scopum desideratum efformaret. Magnam habet constantiam, grani subtilitatem et microstructuram homogeneam, sine gasi vento vel poro.

Ob praestantissimam eius coniunctionem materiae tunicae et subiectae, AlNi coating bene perficiendi sub 700℃ habet. Nunc oppugnatio AlNi putris late adhibetur in indumentis repugnantis coatingis, inclusis instrumentis incisis, formis, autocinetis et industriis constructis.

Materia specialia dives est assisa de manufactura et potest producere Aluminium Nickel Materias putris secundum determinationes Customers. Pro maiori, pete nobis.


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