Wholesale MoNi Sputtering Target High Purity Thin Film Pvd Coating Custom Made Manufacturer and Supplier

Molybdenum Nickel

Moni Sputtering Target High purity thin film Pvd Coating Custom made featured Image

Brevis descriptio:

Categoria	Admisce Sutlering Target
Formulae chemica	Moni
Compositio	Molybdenum Nickel
Puritas	99.9%，99.95%，99.99%
Figura	Plates，Column Targets，arc cathodes，Custom-made
Processus productionis	PM
Available Location	L≤2000mm，W≤200mm

Mitte ad nos inscriptio

Product Detail

Product Tags

Molybdenum Nickel Sputter fabricatur ab Vacuo Melting et AM, et habet commoda Molybdeni mixturae, Molybdaeni et Nickel. Praeclaram habet corrosionem resistentiae morum praesertim ad acidum hydrochloricum, et repugnantiam bonam ad solutiones acidorum sulphurici mediae concentrationis. Posset etiam adhiberi in ambitu acido acetico et phosphorico. Molybdaenum Nickel Putrum potuimus suppeditare cum summa puritate, subtilitate frumenti ac magnitudine boni operis.

Dives Materias Speciales speciales habet in fabricando target putris et Molybdenum Nickel Materias putris secundum specificationes Customers producere potuit. Pro maiori, pete nobis.

Priora: MoNb Sputtering Target High purity thin film PVD Coating Custom made

Next: Mocu Sputtering Target High Munditia Tenuis Film Pvd Coating Custom Made