Wholesale CrFe Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made Manufacturer and Supplier

Chromium Iron

CrFe Alloy Sputtering Target High Mundity thin Film Pvd Coating Custom made Featured Image

Brevis descriptio:

Categoria	Admisce Sutlering Target
Formulae chemica	CrFe
Compositio	Chromium Iron
Puritas	99.9%，99.95%，99.99%
Figura	Plates，Column Targets，arc cathodes，Custom-made
Processus productionis	Vacuum Melting，PM
Available Location	L≤200mm，W≤200mm

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Chromium stannum ferreum putris fictum est per vacuum liquefactionem vel pulveris metallurgiam. CRFe mixturae prima formula adhibita est in industria productionis ferri. Chromium addens in ferro meliorem oxidationem suam et corrosionem resistentiae, dum Chromium in ferrum dejectionem addit
duritiem excitaturum et resistentiam et machinabilitatem induendi emendavit.

Dives Materias Speciales speciales habet in Fabrica Putris Target et Chromium ferreum putris Materias producere potuit secundum determinationes Customers.

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