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CrAlW Alloy Sputtering Target High purity thin film Pvd Coating Custom made

Chrome Aluminium Tungsten

Brevis descriptio:

Categoria

Admisce Sutlering Target

Formulae chemica

CrAlW

Compositio

Chrome Aluminium Tungsten

Puritas

99.7%,99.9%,99.95%,99.99%

Figura

Plates,Column Targets,arc cathodes,Custom-made

Processus productionis

PM

Available Location

L≤2000mm,W≤200mm


Product Detail

Product Tags

Chrome Aluminium Wolfram putris scopum fictum est per pulveris metallurgiam ad altam puritatem, microstructuram homogeneam, altam densitatem et altam electricae conductivity.

Chrome Aluminium Tungsten mixtura perfecta materia est inter connexiones et electrodes industriarum. Habet superficiem levem, rate altam depositionis, duritiem, vim dielectricam, et bene potest miscere cum materia subiecta.

Dives Materias Speciales speciales in manufactura sputris target et Chronici Aluminium Wolfram putris Materias producere potuit secundum determinationes Customers. Productorum nostrorum altam puritatem, structuram homogeneam, densitatem altam nullis segregationis, poris vel rimis. Ad maiorem informationem, pete nobis.


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