Wholesale CrAl Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made Manufacturer and Supplier

Chromium Aluminium

Cral Alloy Sputtering Target High purity thin film PVD Coating Custom made Featured Image

Brevis descriptio:

Categoria	Admisce Sutlering Target
Formulae chemica	CrAl
Compositio	Chromium Aluminium
Puritas	99.7%，99.9%，99.95%，99.99%
Figura	Plates，Column Targets，arc cathodes，Custom-made
Processus productionis	Vacuum Melting，PM
Available Location	L≤2000mm，W≤200mm

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Chromium Aluminium putris fabricatio scuta his gradibus comprehendit:

1. Pulvis stridor et mixtio.

2. Calor isostatice urgeat curationem ut semi-perfectum products.

3. Machinatio chromium aluminium aspera stannum putris materiam scopo ut obtineat chromium aluminium mixturam putris scopo materiali.

Per depositionem processus scutorum putris CrAl durum Aluminium-Chrom-Nitrid (AlCrN) efficiens formatur. Haec coatingis duritiem et oxidationem altam ostendit resistentiae proprietates etiam in caliditate calidi. Caedarii ad altam decurrunt pascuntur ad augendam fructibus ac qualitatem excitandam cum machinarum CNC utentes.

Nostra propria AlCr scuta et possessiones

	Cr-70Alad%	Cr-60Alad%	Cr-50Alad%
Puritas (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density.g/cm*³.	3.7	4.35	4.55
Gpluvia Magnitudo(µm)	100/50	100/50	100/50
Processus	HIP	HIP	HIP

Dives Materias Speciales speciales habet in Fabrica Putris Target et Aluminium Chromium putris Materias producere potuit secundum determinationes Customers. Producti nostri praestantissimae proprietates mechanicae, homogeneae structurae, superficies politae nullis segregationibus, poris et rimis. Pro maiori, pete nobis.

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