Wholesale CoCrTa Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made Manufacturer and Supplier

Cobalt Chromium Tantalum

CoCrTa Alloy Sputtering Target High Mundity thin film Pvd Coating Custom made Featured Image

Brevis descriptio:

Categoria	Admisce Sutlering Target
Formulae chemica	CoCrTa
Compositio	Cobalt Chromium Tantalum
Puritas	99.9%，99.95%，99.99%
Figura	Plates，Column Targets，arc cathodes，Custom-made
Processus productionis	Vacuum Melting
Available Location	L≤200mm，W≤200mm

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Cobalt Chromium Tantalum putris clypeum fabricari per processum emittentem et vacuum liquefactionem. et formantur in scopum desideratum figura. Magnam habet puritatem et microstructuram homogeneam. Co-Cr-Ta usus est materiae criticae magneticae recordationis de proprietatibus magneticis: alta coercitiva, sonitus rerum humilis et quadratae optimae.

Dives Materias Speciales speciales in Fabrica Sputris Target et Cobaltum Chromium Tantalum Putris Materias producere potuit secundum determinationes Customers. Ad maiorem informationem, pete nobis.

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