Wholesale AlTa Sputtering Target High Purity Thin Film PVD Coating Custom Made Manufacturer and Supplier

Aluminium-Tantalum

AlTa Sputtering Target High purity thin film PVD Coating Custom made Featured Image

Brevis descriptio:

Categoria	Admisce Sutlering Target
Formulae chemica	AlTa
Compositio	Aluminium-Tantalum
Puritas	99.9%，99.95%，99.99%
Figura	Plates，Column Targets，arc cathodes，Custom-made
Processus productionis	Vacuum Melting，PM
Available Location	L≤200mm，W≤200mm

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scuta Aluminium et Tantalum pulveres mixtura parantur vel liquefactio vacuum sequitur compactionem ad plenam densitatem. Ita materiae compactae ad libitum sinterantur et formantur in figuram scopum desideratum.

Aluminium Tantalum putris scopum altam puritatem, microstructuram homogeneam et optimam conductivity habet. late in formandis pelliculis tenuibus ad tabulam planae industriae ostentationem adhibita est. Aluminium Tantalum etiam addi potuit ut Titanium mixturam altam perficiendi ad meliorem sui temperaturae opportunitatem emendaret.

Immutatio contenti Al-Ta alloy

compositio	Content.%
	Ta	Fe	Si	C	O
AlTa60	55.0~65.0	≤0.05	≤0.02	≤0.01	≤0.05
AlTa70	65.0~75.0	≤0.05	≤0.02	≤0.01	≤0.05

Dives Materias Speciales speciales in Fabrica Sputris Target et Aluminium Tantalum Putris Materias producere potuit secundum determinationes Customers. Producti nostri praestantissimae proprietates mechanicae, homogeneae structurae, superficies politae nullis segregationibus, poris et rimis. Pro maiori, pete nobis.

Priora: AlTi offensionis Sutlering Target High puritas

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