Grosir NiCrCu Sputtering Target High Purity Thin Film Pvd Coating Custom Made Produsen lan Supplier

Nikel Kromium Tembaga

NiCrCu Sputtering Target High Purity Tipis Film Pvd Coating Custom Made Featured Image

Katrangan singkat:

kategori	Paduan Sputtering Target
Formula Kimia	NiCrCu
Komposisi	Nikel kromium tembaga
Kemurnian	99,5%, 99,7%, 99,9%, 99,99%
wangun	Piring, Target Kolom, katoda busur, Digawe khusus
Proses Produksi	Leleh vakum
Ukuran kasedhiya	L≤2000mm, W≤350mm

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NiCrCu Sputtering target diprodhuksi dening Leleh lan Casting bahan baku saka Nikel Kromium Tembaga. Wis resistivity dhuwur, koefisien suhu kurang lan sensitivitas dhuwur. Nikel lan Kromium duwe energi lumahing padha, lan komposisi NiCrCu tipis-film Deposition padha karo target sputtering, supaya gampang kanggo ngontrol asil Deposition.

Bahan Khusus Sugih spesialisasi ing Pabrik Target Sputtering lan bisa ngasilake Bahan Sputtering Tembaga Kromium Nikel miturut spesifikasi Pelanggan. Kanggo informasi luwih lengkap, hubungi kita.

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