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Nikel Kromium Aluminium Silicon

NiCrAlSi Sputtering Target High Purity Thin Film Pvd Coating Custom Made Featured Image

Katrangan singkat:

kategori	Paduan Sputtering Target
Formula Kimia	NiCrAlSi
Komposisi	Nikel Kromium Aluminium Silicon
Kemurnian	99,5%, 99,9%, 99,95%
wangun	Piring, Target Kolom, katoda busur, Digawe khusus
Proses Produksi	Leleh vakum
Ukuran kasedhiya	L≤1500mm, W≤200mm

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Target Sputtering NiCrAlSi diprodhuksi dening Vacuum Melting, Casting lan Perawatan Panas kanggo njamin konsistensi sing dhuwur, ukuran gandum sing apik lan kinerja sing apik.

Amarga resistivity dhuwur banget, prilaku anti-karat apik, resistance suhu dhuwur lan solderability, Nikel Chromium Aluminium Silicon digunakake digunakake ing akeh aplikasi industri, kalebu Metalurgi, Manufaktur Mechanical, lan Perkakas Rumah Tangga.

Rich Special Materials spesialisasi ing Pabrik Sputtering Target lan bisa ngasilake Nickel Chromium Aluminium Silicon Sputtering Materials miturut spesifikasi Pelanggan. Kanggo informasi luwih lengkap, hubungi kita.

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