Grosir FeCoTa Sputtering Target High Purity Thin Film Pvd Coating Custom Made Produsen lan Supplier

Iron Kobalt Tantalum

FeCoTa Sputtering Target High Purity Thin Film Pvd Coating Custom Made Featured Image

Katrangan singkat:

kategori	Paduan Sputtering Target
Formula Kimia	FeCoTa
Komposisi	Iron Kobalt Tantalum
Kemurnian	99,9%, 99,95%, 99,99%
wangun	Piring, Target Kolom, katoda busur, Digawe khusus
Proses Produksi	Leleh vakum, PM
Ukuran kasedhiya	L≤200mm, W≤200mm

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Detail Produk

Tag produk

Target Iron Cobalt Tantalum biasane kasedhiya ing wangun bunder lan bahan film tipis kritis saka media rekaman magnetik vertikal. Jumlah owahan saka Tantalum ana ing alloy bakal kasil misahake lan saiki partikel undissolved. Kita nggunakake cara produksi unik sing bisa njamin homogeneitas struktur mikro lan nambah sifat mekanik bahan kasebut.

jeneng produk		FeCoTa
Fe/wt%		imbangan	imbangan	imbangan
Co/wt%		21.6±0.5	21.9±0.5	20.2±0.5
Ta/wt%		41.1±0.8	39.4±0.8	44.3±0.8
Kandungan pengotor logam(ppm)	Ni	≤100	≤100	≤100
	Al	≤300	≤300	≤300
	Si	≤200	≤200	≤200
Kandungan pengotor gas(ppm)	C	≤200	≤200	≤200
	N	≤100	≤100	≤100
	O	≤600	≤600	≤600
	S	≤75	≤75	≤75

Bahan Khusus Sugih spesialisasi ing Pabrik Target Sputtering lan bisa ngasilake Bahan Sputtering Tantalum Kobalt Besi miturut spesifikasi Pelanggan. Kanggo informasi luwih lengkap, hubungi kita.

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