Grosir CrAl Alloy Sputtering Target High Purity Tipis Film PVD Coating Custom Made Produsen lan Supplier

Kromium Aluminium Kab

CrAl Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made Featured Image

Katrangan singkat:

kategori	Paduan Sputtering Target
Formula Kimia	CrAl
Komposisi	Kromium Aluminium Kab
Kemurnian	99,7%, 99,9%, 99,95%, 99,99%
wangun	Piring, Target Kolom, katoda busur, Digawe khusus
Proses Produksi	Leleh vakum, PM
Ukuran kasedhiya	L≤2000mm, W≤200mm

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Detail Produk

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Fabrikasi Target Sputtering Chromium Aluminium kalebu langkah-langkah ing ngisor iki:

1. Powder grinding lan nyawiji.

2. Perawatan pencet isostatik panas kanggo entuk produk semi-rampung.

3. Machining krom aluminium alloy sputtering materi target atos kanggo njupuk kromium aluminium alloy sputtering materi target.

Sajrone proses deposisi target sputtering CrAl, lapisan Aluminium-Chrom-Nitrid (AlCrN) sing keras dibentuk. Lapisan iki nuduhake sifat kekerasan lan tahan oksidasi sing dhuwur sanajan ing suhu dhuwur. Pemotong bisa mlaku ing feed dhuwur kanggo nambah produktivitas lan ningkatake kualitas nalika nggunakake mesin CNC.

Target AlCr khas kita lan sifate

	Cr-70Aling%	Cr-60Aling%	Cr-50Aling%
Kemurnian (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Kapadhetan(g/cm³）	3.7	4.35	4.55
Gudan Ukuran(µm)	100/50	100/50	100/50
Proses	HIP	HIP	HIP

Bahan Khusus Sugih spesialisasi ing Pabrik Target Sputtering lan bisa ngasilake Bahan Sputtering Kromium Aluminium miturut spesifikasi Pelanggan. Produk kita nduweni sifat mekanik sing apik, struktur homogen, permukaan sing polesan tanpa pamisahan, pori utawa retak. Kanggo informasi luwih lengkap, hubungi kita.

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