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ZrAl Alloy sputtering Target High Purity Thin Film Pvd Coating Custom Mere

Zirconium aluminum

Nkọwa dị mkpirikpi:

Otu

Alloy Sputtering Target

Usoro ọgwụ

ZrAl

Ihe mejupụtara

Zirconium aluminum

Ịdị ọcha

99.5%, 99.7%, 99.9%

Ụdị

Efere , Kọlụm Ezubere , arc cathodes , emebere ahaziri ahazi

Usoro mmepụta

Ịgbaze Vacuum, PM

Nha dị

L≤200mm, W≤200mm


Nkọwa ngwaahịa

Mkpado ngwaahịa

Zirconium Aluminom na-agbaze ebumnobi bụ ihe eji agbaze oghere na ntụ ntụ. Zr-Al alloys dị ka ihe mejupụtara matrix metal dị elu na-adọrọ mmasị maka ngwa pụrụ iche dị iche iche. Zirconium bụ obere mgbakwunye na aluminom alloys.

Ọnụnọ nke zirconium na aluminom alloys nwere ike ibelata ike nke corrosion nrụgide na igbochi recrystallization na uto ọka na okpomọkụ dị elu.

Ọgaranya ihe pụrụ iche bụ onye nrụpụta nke Sputtering Target ma nwee ike mepụta Zirconium Aluminom sputtering Materials dị ka nkọwa ndị ahịa si dị. Maka ozi ndị ọzọ, biko kpọtụrụ anyị.


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