V Sputtering Target High Purity Thin Film Pvd Coating Custom Mere
Vanadium
Nkọwapụta Vanadium Sputtering Target
Vanadium bụ ígwè siri ike, nke nwere ductile nwere ọdịdị ọlaọcha-isi awọ. Ọ siri ike karịa ọtụtụ ọla ma na-egosipụta ezigbo nguzogide corrosion megide alkalis na acids. Ebe agbaze ya bụ 1890 ℃, ebe isi ya bụ 3380 ℃. Nọmba atomic ya bụ 23, na ịdị arọ atọm bụ 50.9414. Ọ nwere usoro cubic nke gbadoro ụkwụ na ihu na steeti oxidation na ogige ya +5, +4, +3 na +2. Ọ nwere ebe mgbaze dị elu, ductility, hardness, and corrosion resistance.
A na-eji Vanadium eme ihe nke ukwuu n'ọtụtụ ụlọ ọrụ na ngwa, dị ka injin ụgbọ elu, okpokolo agba ikuku dị elu, ihe nrụpụta nuklia na ntinye ígwè.
Ebumnuche dị elu Vanadium sputtering bụ ihe dị oke mkpa maka sel anyanwụ na mkpuchi oghere anya.
Nyocha kemịkalụ
| Ịdị ọcha | 99.7 | 99.9 | 99.95 | 99.99 |
| Fe | ≤0.1 | ≤0.05 | ≤0.02 | ≤0.01 |
| Al | ≤0.2 | ≤0.05 | ≤0.03 | ≤0.01 |
| Si | ≤0.15 | ≤0.1 | ≤0.05 | ≤0.01 |
| C | ≤0.03 | ≤0.02 | ≤0.01 | ≤0.01 |
| N | ≤0.01 | ≤0.01 | ≤0.01 | ≤0.01 |
| O | ≤0.05 | ≤0.05 | ≤0.05 | ≤0.03 |
| Ọdịghị ọcha na mkpokọta | ≤0.3 | ≤0.1 | ≤0.05 | ≤0.01 |
Nkwakọ ngwaahịa Vanadium Sputtering Target
Ebumnuche Vanadium sputter anyị bụ akara nke ọma ma kpọọ ya n'èzí iji hụ na njirimara na njikwa mma dị mma. A na-akpachapụ anya nke ukwuu iji zere mmebi ọ bụla nwere ike ịkpata n'oge nchekwa ma ọ bụ njem.
Nweta kọntaktị
Ebumnuche RSM nke vanadium sputtering na-enye ịdị ọcha na nkwụsi ike. Ha dị n'ụdị dị iche iche, ịdị ọcha, nha na ọnụahịa. Anyị pụrụ iche na elu ịdị ọcha mkpa film mkpuchi ihe na magburu onwe Njirimara, nakwa dị ka ndị kasị elu kwere omume njupụta na kacha nta kwere omume nkezi ọka size, n'ihi na anwụ mkpuchi, mma, akpakanamde akụkụ, ala E iko, semiconductor integrated sekit, mkpa film resistors, graphic ngosi. , Aerospace, magnetik ndekọ, ihuenyo mmetụ, mkpa film anyanwụ cell na ndị ọzọ anụ ahụ vapor deposition (PVD) ngwa. Biko zitere anyị ajụjụ maka ọnụahịa ugbu a maka ebumnuche ịgbasa na ihe nkwụnye ego ndị ọzọ edepụtaghị.
