Iberibe Silicide Tungsten

Tungsten silicide WSi2 na-eji dị ka ihe ọkụ eletrik na microelectronics, shunting na polysilicon wires, mgbochi oxidation mkpuchi na iguzogide waya mkpuchi. A na-eji silicide Tungsten mee ihe dị ka ihe kọntaktị na microelectronics, yana nkwụsị nke 60-80μΩcm. A na-eme ya na 1000 ° C. A na-ejikarị ya dị ka shunt maka ahịrị polysilicon iji mee ka omume ya dịkwuo elu ma mụbaa ọsọ mgbama. Enwere ike ịkwado oyi akwa silicide tungsten site na ntinye mmiri nke kemịkalụ, dị ka ntinye mmiri. Jiri monosilane ma ọ bụ dichlorosilane na tungsten hexafluoride dị ka ikuku akụrụngwa. Ihe nkiri echekwara abụghị stoichiometric ma na-achọ ka annealing gbanwee ka ọ bụrụ ụdị stoichiometric na-eduzi karịa.

Tungsten silicide nwere ike dochie ihe nkiri tungsten mbụ. A na-ejikwa silicide Tungsten dị ka ihe mgbochi n'etiti silicon na ọla ndị ọzọ.

Tungsten silicide dịkwa oke ọnụ ahịa na sistemụ microelectromechanical, n'ime nke tungsten silicide na-ejikarị dị ka ihe nkiri dị mkpa maka imepụta microcircuits. Maka nke a, ihe nkiri tungsten silicide nwere ike ịbụ plasma-etched iji, dịka ọmụmaatụ, silicide.

Ihe ndị pụrụ iche bara ọgaranya bụ ọkachamara na nrụpụta nke Sputtering Target ma nwee ike imepụta Tungsten Silicide.iberibedị ka ndị ahịa si nkọwa. Maka ozi ndị ọzọ, biko kpọtụrụ anyị.