NiTa Sputtering Target High Purity Thin Film Pvd Coating Custom Mere

Nickel Tantalum Sputtering Targets bụ nke a na-arụpụta site na ịgbaze oghere ma ọ bụ usoro nchara ntụ ntụ. Ọ nwere nnukwu ịdị ọcha na microstructure homogeneous.

A na-eji Nickel Tantalum Sputtering Targets eme ihe na mbara igwe, ụgbọ elu, ụlọ ọrụ igodo. Nkwụsi ike ya dị mma maka mmeghachi omume ihu igwe dị elu na-enweta site na nnukwu Tantalum dị na alloy, nke nwere okpomọkụ na-agbaze nke 3000 ° C. A na-agbakwunyekarị aluminom, Yttrium na Chronium iji melite akụrụngwa.

Ngwa ndị pụrụiche bara ọgaranya bụ ọkachamara na nrụpụta nke Sputtering Target ma nwee ike imepụta ngwa ngwa nickel Tantalum dịka nkọwa ndị ahịa si dị. Maka ozi ndị ọzọ, biko kpọtụrụ anyị.