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NiCrAlSi Sputtering Target High ịdị ọcha Ihe nkiri Pvd mkpuchi omenala emere

Nickel Chromium Aluminom Silicon

Nkọwa dị mkpirikpi:

Otu

Alloy Sputtering Target

Usoro ọgwụ

NiCrAlSi

Ihe mejupụtara

Nickel Chromium Aluminom Silicon

Ịdị ọcha

99.5%, 99.9%, 99.95%

Ụdị

Efere , Kọlụm Ezubere , arc cathodes , emebere ahaziri ahazi

Usoro mmepụta

Ịgbaze Vacuum

Nha dị

L≤1500mm, W≤200mm


Nkọwa ngwaahịa

Mkpado ngwaahịa

A na-emepụta ebumnuche NiCrAlSi Sputtering site na Vacuum Melting, Casting and Hot Treatment iji hụ na nkwekọ dị elu, nha ọka dị mma na arụmọrụ dị mma.

N'ihi oke mgbochi ya dị elu, ezigbo mgbochi corrosion, nguzogide okpomọkụ na ịdị elu, a na-eji Nickel Chromium Aluminom Silicon alloy mee ihe n'ọtụtụ ngwa ụlọ ọrụ, gụnyere Metallurgy, Mechanical Productions, na Ngwa ụlọ.

Ngwa ahịa pụrụ iche bara ọgaranya bụ ọkachamara na nrụpụta nke Sputtering Target ma nwee ike mepụta Nickel Chromium Aluminom Silicon Sputtering Materials dị ka nkọwa ndị ahịa si dị. Maka ozi ndị ọzọ, biko kpọtụrụ anyị.


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