AlNi Alloy sputtering Target High Purity Thin Film PVD mkpuchi omenala emere

A na-emepụta ebumnuche aluminom nickel alloy sputtering site na mgbaze oghere na ike igwe. Ịgwakọta Aluminom na Nickel n'ọnụ ego dị mkpa iji nye AlNi nkedo ingot. A na-egbutu ihe nkedo ka ọ bụrụ ọdịdị ebumnuche achọrọ. Ọ nwere nguzosi ike dị elu, nha ọka a nụchara anụcha na microstructure na-enweghị atụ, na-enweghị gas puff ma ọ bụ pores.

N'ihi nchikota ya magburu onwe ya nke mkpuchi na ihe nkedo, mkpuchi AlNi nwere arụmọrụ dị mma n'okpuru 700 ℃. Ugbu a, a na-eji ebumnobi AlNi eme ihe n'ọtụtụ ebe na mkpuchi mkpuchi na-eguzogide ọgwụ, gụnyere ngwaọrụ ịkpụ, ebu, ụgbọ ala na ụlọ ọrụ ihe owuwu.

Ọgaranya ihe pụrụ iche bụ onye nrụpụta nke Sputtering Target ma nwee ike imepụta ihe na-agbapụta Aluminom nickel dịka nkọwapụta ndị ahịa si dị. Maka ozi ndị ọzọ, biko kpọtụrụ anyị.