Ugbu a ọtụtụ ndị ọrụ na-aghọta ụdị nke lekwasịrị anya nangwa ya, mana nkewa ya nwere ike ọ gaghị edo anya. Ugbu a, ka anyịOnye injinia RSM ịkọrọ gịụfọdụ induction nke magnetron sputtering lekwasịrị.
Ihe mgbaru ọsọ na-agbapụ: ebumnuche mkpuchi metal sputtering, alloy sputtering mkpuchi lekwasịrị, seramiiki sputtering ebumnuche, boride seramiiki sputtering lekwasịrị, carbide seramiiki sputtering lekwasịrị, fluoride seramiiki sputtering lekwasịrị, nitride seramiiki sputtering lekwasịrị, oxide seramiiki lekwasịrị, selenide seramiiki sputtering target, selenide seramiiki sputtering lekwasịrị anya. ebumnuche, seramiiki sulfide ebumnuche ịgbasa, telluride ceramic sputtering target, ebumnuche seramiiki ndị ọzọ, Chromium doped silicon oxide ceramic target (CR SiO), ebumnuche indium phosphide (INP), ebumnuche arsenide (pbas), ebumnuche indium arsenide (InAs).
A na-ekekarị sputtering Magnetron ụzọ abụọ: DC sputtering na RF sputtering. Ụkpụrụ nke akụrụngwa sputter DC dị mfe, na ọnụego ya dịkwa ngwa ngwa mgbe ị na-agbapụta ígwè. A na-eji sputtering RF eme ihe n'ọtụtụ ebe. Na mgbakwunye na sputtering conductive data, ọ nwekwara ike ịgbasa data na-adịghị eduzi. E nwekwara ike iji ihe ebumpụta ụwa mee ihe maka ịgbasa nhịahụ iji kwado data ngwakọta dị ka oxides, nitrides na carbides. Ọ bụrụ na ugboro RF na-abawanye, ọ ga-aghọ ngwa ngwa plasma sputtering. Ka ọ dị ugbu a, a na-ejikarị ikuku plasma na-agbapụta eletrọn cyclotron resonance (ECR).
Oge nzipu: Mee-26-2022