Vacuum plating na nhọrọ nke sputtering lekwasịrị anya ihe bụ okwu maka ndị mmadụ, ugbu a, dị ka sputtering mkpuchi, karịsịa mmepe nke magnetron sputtering nkà mkpuchi, nwere ike kwuru maka ozi ọ bụla na-enwe ike lekwasịrị ihe onwunwe nkwadebe nke mkpa fim. site na ion bombardment, n'ihi na site na sputtering lekwasịrị anya ihe na usoro nke mkpuchi na ụdị nke mkpụrụ, nwere mmetụta dị mkpa na àgwà sputtering film, Ya mere, ezubere iche ihe onwunwe chọrọ ka ndị ọzọ. eriri siri ike. N'ebe a, anyị ga-amụta banyere ọrụ nke ịgbasa ebumnobi na mkpuchi agụụ yana onye nchịkọta akụkọ nke Beijing Relaxation.
一, Ụkpụrụ nhọrọ na nhazi nke ihe ezubere iche
Na nhọrọ nke ihe ezubere iche, na mgbakwunye na iji ihe nkiri ahụ n'onwe ya kwesịrị ịhọrọ, a ga-atụlekwa nsogbu ndị a:
Nsogbu 1. Dị ka iji na ịrụ ọrụ chọrọ nke akpụkpọ ahụ, ọ dị mkpa maka ihe a na-achọsi ike iji mezuo ihe ndị chọrọ nkà na ụzụ nke ịdị ọcha, ọdịnaya magazin, otu akụkụ, nhazi nhazi na ihe ndị ọzọ.
Nsogbu 2. The lekwasịrị ihe onwunwe kwesịrị inwe ezi n'ibu ike na chemical kwụsie ike mgbe film akpụ;
Nsogbu 3. Ọ dị mkpa ka ihe nkiri ahụ na-emepụta ihe nkiri ihe nkiri dị mfe na gas mmeghachi omume dị ka ihe nkiri na-agbapụta ihe;
Nsogbu 4. Ọ dị mkpa ịtọ ihe mgbaru ọsọ na matriks ka ọ dị ike, ma ọ bụghị ya, a ga-anakwere ihe nkiri ahụ nke nwere ezigbo adhesion na matrix ahụ, buru ụzọ gbasaa oyi akwa nke ihe nkiri ala wee kwadebe ihe nkiri ihe nkiri achọrọ;
Ajụjụ 5. N'ihe gbasara imezu ihe ndị chọrọ ịrụ ọrụ nke ihe nkiri ahụ, obere ọdịiche dị n'etiti ọnụọgụ mgbasawanye ọkụ nke ihe mgbaru ọsọ na matrix, nke ka mma, iji belata mmetụta nke nrụgide okpomọkụ nke ihe nkiri na-agbapụ;
Nkwadebe nke ọtụtụ ebumnuche ndị a na-ejikarị eme ihe
(1) cr ebumnuche
Chromium dị ka sputtering film ihe abụghị nanị mfe ikpokọta na isi ihe nwere elu adhesion, na chromium na oxide CrQ3 film, ya n'ibu Njirimara, acid iguzogide na thermal kwụsie ike mma.
Beijing Ruichi High-tech Co., Ltd. na-etinyekarị aka na: titanium lekwasịrị zirconium, ebumnuche aluminom, ebumnuche nickel, ebumnuche chromium, ebumnuche tungsten, ebumnuche molybdenum, ebumnuche ọla kọpa, ebumnuche silicon, ebumnuche niobium, ebumnuche tantalum, titanium-silicon alloy lekwasịrị anya, titanium-niobium alloy target, titanium-tungsten alloy target, titanium-zirconium alloy target, nickel-chromium alloy target, silica-aluminum alloy target, nickel-vanadium alloy target, chromium-aluminum-silicon ternary alloy target, Ti al si ternary alloy target material, nke a na-ejikarị na ịchọ mma / elu siri ike na mkpuchi arụ ọrụ, iko ụkpụrụ ụlọ, ihe ngosi ewepụghị / ngwa anya fotoelectric , Nchekwa ngwa anya, ngwa eletrọnịkị, mbipụta na ọrụ ndị ọzọ.
Oge nzipu: Jun-02-2022