Gịnị bụ magnetron sputtering ihe ebumnuche

Metal sputtering ihe, mkpuchi alloy sputtering mkpuchi ihe, seramiiki sputtering ihe mkpuchi, boride seramiiki sputtering lekwasịrị ihe, carbide seramiiki sputtering lekwasịrị ihe onwunwe, fluoride seramiiki sputtering lekwasịrị ihe onwunwe, Nitride seramiiki sputtering lekwasịrị ihe, oxide seramiiki lekwasịrị, Selenide seramiiki lekwasịrị anya ihe, sputtering ihe onwunwe Silicide seramiiki sputtering ihe ebumnuche, sulfide seramiiki sputtering lekwasịrị anya ihe, Telluride seramiiki sputtering lekwasịrị anya, ndị ọzọ seramiiki lekwasịrị, chromium-doped silicon oxide seramiiki lekwasịrị (CR-SiO), indium Phosphide target (InP), na-edu Arsenide target (PbAs), Indium Arsenide lekwasịrị anya (InAs).

Ihe mgbaru ọsọ dị elu na ịdị ọcha dị elu na njupụta dị elu bụ:

Ihe ebum n'obi na-agbasa (ịdị ọcha: 99.9%-99.999%)

1. Ihe nleba anya igwe:

Nickel target, Ni, Titanium target, Ti, zinc target, Zn, chromium target, Cr, magnesium target, mg, Niobium target, Nb, Tin target, Sn, aluminum target, Al, Indium target, In, Iron target, Fe, Ihe mgbaru ọsọ aluminom zirconium, ZrAl, Titanium aluminom lekwasịrị anya, TiAl, ebumnuche Zirconium, Zr, aluminom-silicon target, AlSi, silicon target, Si, ebumnuche ọla kọpa Cu, tantalum lekwasịrị anya T, A, Ebumnuche Germanium, Ge, ebumnuche ọla ọcha, Ag, ebumnuche cobalt, Co, ebumnuche ọla edo, Au, ebumnuche gadolinium, Gd, ebumnuche lanthanum, La, yttrium target, Y, ebumnuche cerium, Ce, tungsten, W, ebumnuche igwe anaghị agba nchara, nickel Ebumnuche chromium, NiCr, ebumnuche hafnium, Hf, ebumnuche molybdenum, Mo, Fe-Ni lekwasịrị anya, FeNi, ebumnuche tungsten, W, wdg.

2. Ceramic lekwasịrị anya ihe

ITO lekwasịrị anya, ferric oxide, magnesium oxide target, target, target, silicon carbide silicon nitride titanium nitride target target, target, zinc sulfide, zinc oxide, chromium oxide, silicon dioxide, target, target a silicon oxide, cerium oxide target, lekwasịrị anya, ise zirconium dioxide oxygen HuaEr niobium ebumnuche ebumnuche, ebumnuche, titanium dioxide, zirconium dioxide, ebumnuche hafnium, ebumnuche, titanium ebumnuche diboride diboride zirconium, tungsten trioxide target, aluminum trioxide target tantalum pentaoxide, niobium pentaoxide target, magnesium fluoride target, yttrium fluoride target, zinc selenide target, aluminum nitride target, silicon nitride target, boron nitride target, titanium nitride target, silicon carbide target. , lithium niobate target, praseodymium titanate target, barium ebumnuche titanate, ebumnuche lanthanum titanate, nickel oxide target, sputtering target, wdg.