Site na mmụba nke ahịa ahịa, a na-emelite ọtụtụ ụdị ebumnuche sputtering mgbe niile. Ụfọdụ maara nke ọma ma ụfọdụ amachaghị ndị ahịa. Ugbu a, anyị ga-achọ ịkọrọ gị ụdị ebumnuche magnetron sputtering.
Ihe mgbaru ọsọ sputtering nwere ụdị ndị a: ebumnuche mkpuchi mkpuchi igwe, ihe mkpuchi mkpuchi alloy sputtering, ebumnuche mkpuchi seramiiki, ebumnuche seramiki sputtering, ebumnuche seramiiki carbide, ebumnuche sputtering fluoride, nitride seramiiki sputtering, nitride seramiiki sputtering, oxide seramiiki lekwasịrị anya, selenide seramiiki lekwasịrị anya. , silicide seramiiki sputtering ebumnuche, Sulfide ceramic sputtering target, telluride seramiiki sputtering lekwasịrị anya, ebumnuche seramiiki ndị ọzọ, Chromium doped silicon oxide ceramic target (CR SiO), indium phosphide target (INP), ebumnuche arsenide (pbas), ebumnuche indium arsenide (InAs).
A na-ekekarị sputtering Magnetron ụzọ abụọ: DC sputtering na RF sputtering. Ụkpụrụ nke akụrụngwa sputter DC dị mfe, na ọnụego ya dịkwa ngwa ngwa mgbe ị na-agbapụta ígwè. A na-eji sputtering RF eme ihe n'ọtụtụ ebe. Na mgbakwunye na sputtering conductive data, ọ nwekwara ike ịgbasa data na-adịghị eduzi. N'otu oge ahụ, ebumnobi na-agbapụta na-arụkwa ọrụ ịgbasa iji kwadebe data ngwakọta dị ka oxides, nitrides na carbides. Ọ bụrụ na ugboro RF na-abawanye, ọ ga-aghọ ngwa ngwa plasma sputtering. Ka ọ dị ugbu a, a na-ejikarị ikuku plasma na-agbapụta eletrọn cyclotron resonance (ECR).
Oge nzipu: Mee-18-2022