Banyere ngwa na ụkpụrụ nke sputtering lekwasịrị nkà na ụzụ, ụfọdụ ahịa na-agakwuru RSM, ugbu a maka nsogbu a na-eche banyere , teknuzu ọkachamara na-ekerịta ụfọdụ kpọmkwem metụtara ihe ọmụma.
Ngwa ebumnuche na-agbasa:
Ihe nchaji (dị ka argon ions) na-atụ bọmbụ n'elu elu siri ike, na-eme ka ụmụ irighiri ihe dị n'elu, dị ka atom, molecules ma ọ bụ ngwugwu gbanarị elu nke ihe a na-akpọ "sputtering". Na mkpuchi magnetron sputtering, a na-ejikarị ion dị mma na-emepụta site na argon ionization iji bombu ihe siri ike (lekwasịrị anya), na atọm ndị na-anọpụ iche na-edobe na mkpụrụ (workpiece) iji mepụta oyi akwa ihe nkiri. Mkpuchi sputtering Magnetron nwere àgwà abụọ: "obere okpomọkụ" na "ngwa ngwa".
Ụkpụrụ sputtering Magnetron:
A na-agbakwunye oghere ndọta orthogonal na mpaghara eletrik n'etiti oghere ebumnuche sputtered (cathode) na anode, na gas inert achọrọ (na-abụkarị Ar gas) na-ejupụta n'ọnụ ụlọ dị elu. Ihe ndọta na-adịgide adịgide na-etolite oghere magnetik 250-350 Gauss n'elu ihe a na-achọsi ike, wee mepụta oghere electromagnetic orthogonal nwere oke ọkụ eletrik dị elu.
N'okpuru ọrụ nke ọkụ eletrik, Ar gas na-ionized n'ime nti ion na electrons, na e nwere ụfọdụ adịghị mma elu nrụgide na lekwasịrị anya, otú electrons emitted si lekwasịrị osisi na-emetụta magnetik na ionization puru omume nke na-arụ ọrụ. gas na-abawanye. A na-emepụta plasma dị elu n'akụkụ cathode, na Ar ions na-agbaba n'elu ebe a na-achọsi ike n'okpuru ọrụ nke Lorentz ma na-atụba elu elu ahụ n'ọsọ dị elu, nke mere na atom ndị na-agbapụta n'elu ihe mgbaru ọsọ gbapụ n'elu ebe a na-achọsi ike. ike kinetic wee fega na mkpụrụ osisi ka ọ mepụta ihe nkiri dịka ụkpụrụ nke ntugharị ọkụ si dị.
A na-ekekarị sputtering Magnetron ụzọ abụọ: sputtering DC na RF sputtering. Ụkpụrụ nke akụrụngwa sputter DC dị mfe, na ọnụego dị ngwa ngwa mgbe ị na-agbapụta ígwè. Ojiji nke RF sputtering ka ukwuu, na mgbakwunye na ịgbasa ihe na-eduzi, kamakwa na-efesa ihe ndị na-adịghị arụ ọrụ, kamakwa nkwadebe sputtering nke oxides, nitrides na carbides na ihe ndị ọzọ mejupụtara. Ọ bụrụ na ugboro nke RF na-abawanye, ọ na-aghọ ngwa ndakwa nri plasma sputtering. Ka ọ dị ugbu a, a na-ejikarị ikuku plasma sputtering ụdị eletrọn cyclotron resonance (ECR).
Oge nzipu: Ọgọst-01-2022