Enwere ike kewaa ya na DC magnetron sputtering na RF magnetron sputtering.
Usoro sputter DC na-achọ ka onye lekwasịrị anya nwere ike ịnyefe ụgwọ dị mma nke enwetara site na usoro bombu ion na cathode na kọntaktị ya na ya, mgbe ahụ, usoro a nwere ike gbasaa naanị data onye nduzi, nke na-adabaghị maka data mkpuchi, n'ihi na ion ụgwọ n'elu enweghị ike neutralized mgbe bombarding mkpuchi ihe mgbaru ọsọ, nke ga-eduga na-abawanye nke nwere ike n'elu lekwasịrị n'elu, na ihe fọrọ nke nta niile etinye voltaji etinyere na lekwasịrị anya, otú ohere nke ion. acceleration na ionization n'etiti abụọ okporo osisi ga-ebelata, ma ọ bụ ọbụna enweghị ike ionized, Ọ na-eduga na ọdịda nke na-aga n'ihu ihapu, ọbụna ihapu nkwụsị na sputtering nkwụsị. Ya mere, a ga-ejirịrị sputter ugboro redio (RF) maka mkpuchi mkpuchi ma ọ bụ ebumnuche ndị na-abụghị ọla na arụrụ arụ adịghị mma.
Usoro sputtering na-agụnye usoro ịgbasa mgbagwoju anya na usoro nnyefe ike dị iche iche: nke mbụ, ụmụ irighiri ihe ndị ahụ merenụ na-adaba n'ụzọ na-agbanwe agbanwe na atom ezubere iche, na akụkụ nke ike nke kinetic nke ihe ahụ merenụ ga-ebufe na atom ndị e lekwasịrị anya. The kinetic ume nke ụfọdụ atom ebumnuche karịrị ihe mgbochi nwere ike kpụrụ atom ndị ọzọ gbara ha gburugburu (5-10ev maka ọla), mgbe ahụ, a na-akụtu ha site na lattice lattice lattice ka ha mepụta atọm ndị na-anọghị na saịtị, na nkwukọrịta ugboro ugboro na atọm dị n'akụkụ. , na-ebute nkukota cascade. Mgbe ihe nkukota nke a na-erute n'elu ihe mgbaru ọsọ, ma ọ bụrụ na ike kinetic nke atom dị nso n'elu ihe mgbaru ọsọ dị ukwuu karịa ike na-ejikọta elu (1-6ev maka metals), atom ndị a ga-ekewapụ n'elu ihe mgbaru ọsọ. ma banye na oghere.
Mkpuchi ịgbasa bụ nka nke iji ụmụ irighiri ihe na-ebufe ibu na-atụba n'elu ebumnuche na oghere iji mee ka ụmụ irighiri ihe ndị ahụ gbabanyere gbakọta na mkpụrụ. Dị ka ọ na-adịkarị, a na-eji mwepu ọkụ inert gas dị ala na-emepụta ion merenụ. A na-eji ihe mkpuchi nke cathode mee ihe, a na-eji mkpụrụ ahụ dị ka anode, 0.1-10pa argon ma ọ bụ gas inert ndị ọzọ na-ewebata n'ime oghere oghere, na-egbuke egbuke na-apụta n'okpuru omume nke cathode (lekwasịrị) 1-3kv DC adịghị mma elu. voltaji ma ọ bụ 13.56MHz RF voltaji. Argon ionized ion na-atụ bọmbụ n'elu ebumnuche ahụ, na-eme ka atom ndị e lekwasịrị anya fesa ma gbakọta n'ime mkpụrụ ahụ iji mepụta ihe nkiri dị mkpa. Ka ọ dị ugbu a, enwere ọtụtụ ụzọ ịgbasa sputtering, tumadi gụnyere ịgbasa sputtering nke abụọ, nke atọ ma ọ bụ quaternary sputtering, sputtering magnetron, sputtering lekwasịrị anya, sputtering RF, sputtering elere anya, asymmetric nkwurịta okwu RF sputtering, ion beam sputtering na reactive sputtering.
N'ihi na atom sputtered na-efesa si mgbe gbanwere kinetic ume na nti ion na iri iri nke electron volts ume, sputtered atom nwere elu ume, nke na-enyere aka melite mgbasa ikike nke atọm n'oge stacking, na-eme ka mma nke stacking ndokwa, na-eme ka mma nke stacking ndokwa. ihe nkiri a kwadebere nwere ike nrapado na mkpụrụ.
N'oge sputtering, mgbe gas na-ionized, na gas ion na-efega na lekwasịrị ejikọrọ na cathode n'okpuru ọrụ nke eletriki eletrik, na electrons ofufe na ala mgbidi oghere na mkpụrụ. N'ụzọ dị otú a, n'okpuru obere voltaji na nrụgide dị ala, ọnụ ọgụgụ nke ions dị ntakịrị na ike ịgbasa ihe mgbaru ọsọ dị ala; Na nnukwu voltaji na nrụgide dị elu, ọ bụ ezie na ion ndị ọzọ nwere ike ime, ndị electrons na-efegharị na mkpụrụ nwere ike dị elu, nke dị mfe ikpo ọkụ na ọbụna sputtering nke abụọ, na-emetụta àgwà ihe nkiri ahụ. Na mgbakwunye, ihe gbasara nke puru omume nke nkukota n'etiti atom ebumnuche na ikuku gas na usoro nke ife efe na mkpụrụ na-abawanye nke ukwuu. Ya mere, a ga-agbasasị ya na oghere dum, nke na-agaghị emefusị ihe mgbaru ọsọ ahụ, kamakwa imetọ oyi akwa ọ bụla n'oge nkwadebe nke ihe nkiri multilayer.
Iji dozie adịghị ike ndị a dị n'elu, e mepụtara teknụzụ sputtering DC magnetron na 1970s. Ọ na-emeri nke ọma adịghị ike nke obere cathode sputtering ọnụego yana mmụba nke mkpụrụ osisi nke electrons kpatara. Ya mere, e mepụtara ya ngwa ngwa na ọtụtụ ebe.
Ụkpụrụ bụ dị ka ndị a: na magnetron sputtering, n'ihi na electrons na-akpụ akpụ na-edobere Lorentz ike na magnetik, ha na-emegharị orbit ga-ata ahụhụ ma ọ bụ ọbụna gburugburu ngagharị, na ha ngagharị ụzọ ga-adị ogologo. Ya mere, ọnụ ọgụgụ nke esemokwu na ụmụ irighiri gas na-arụ ọrụ na-abawanye, nke mere na njupụta plasma na-abawanye, mgbe ahụ, ọnụọgụ nke magnetron na-eme ka ọ dịkwuo mma, ọ pụkwara ịrụ ọrụ n'okpuru voltaji dị ala na nrụgide iji belata ọdịdị nke mmetọ ihe nkiri; N'aka nke ọzọ, ọ na-eme ka ike nke atoms na-eme n'elu ihe nkedo ahụ, ya mere enwere ike imeziwanye ihe nkiri ahụ ruo n'ókè dị ukwuu. N'otu oge ahụ, mgbe electrons na-efunahụ ike site na otutu nkukota rutere anode, ha aghọwo obere ume electrons, na mgbe ahụ mkpụrụ agaghị ekpo oke ọkụ. Ya mere, magnetron sputtering nwere uru nke "oke ọsọ" na "obere okpomọkụ". Ọdịmma nke usoro a bụ na enweghị ike ịkwadebe ihe nkiri insulator, yana oghere ndọta na-ezighi ezi nke ejiri na magnetron electrode ga-eme ka etching nke ebumnuche doro anya na-ezighi ezi, na-ebute ọnụego ojiji nke ebumnuche dị ala, nke na-abụkarị naanị 20% - 30. %
Oge nzipu: Mee-16-2022