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MoNi Sputtering Target High ịdị ọcha Ihe nkiri Pvd mkpuchi nke emere

Molybdenum nickel

Nkọwa dị mkpirikpi:

Otu

Alloy Sputtering Target

Usoro ọgwụ

MoNi

Ihe mejupụtara

Molybdenum nickel

Ịdị ọcha

99.9%, 99.95%, 99.99%

Ụdị

Efere , Kọlụm Ezubere , arc cathodes , emebere ahaziri ahazi

Usoro mmepụta

PM

Nha dị

L≤2000mm, W≤200mm


Nkọwa ngwaahịa

Mkpado ngwaahịa

Molybdenum Nickel Sputtering Target bụ nke Vacuum Melting na PM mebere ya, ọ nwekwara uru nke Molybdenum alloy, Molybdenum na Nickel. Ọ nwere ezigbo àgwà nguzogide corrosion karịsịa na hydrochloric acid, yana ezigbo iguzogide ngwọta sulfuric acid nke ọkara. Enwere ike iji ya na acetic na phosphoric acid gburugburu. Anyị nwere ike ịnye Molybdenum Nickel Sputtering Target na ịdị ọcha dị elu, nha ọka dị mma yana arụmọrụ dị mma.

Ngwa ahịa pụrụ iche bara ọgaranya bụ ọkachamara na nrụpụta nke Sputtering Target ma nwee ike mepụta Molybdenum Nickel Sputtering Materials dị ka nkọwa ndị ahịa si dị. Maka ozi ndị ọzọ, biko kpọtụrụ anyị.


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