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FeV sputtering Target High Purity Thin Film Pvd mkpuchi omenala emere

Iron Vanadium

Nkọwa dị mkpirikpi:

Otu

Alloy Sputtering Target

Usoro ọgwụ

FeV

Ihe mejupụtara

Iron Vanadium

Ịdị ọcha

99.9%, 99.95%, 99.99%

Ụdị

Efere , Kọlụm Ezubere , arc cathodes , emebere ahaziri ahazi

Usoro mmepụta

Ịgbaze Vacuum

Nha dị

L≤200mm, W≤200mm


Nkọwa ngwaahịa

Mkpado ngwaahịa

A na-emepụta ebumnuche ịgbasa iron Vanadium site na mkpuchi oghere, ebe Vanadium Pentoxide na-ejikarị dị ka ihe mejupụtara ya. A na-ejikarị ígwè Vanadium alloy eme ihe dị ka ihe mgbakwunye maka ígwè alloy ma ọ bụ ihe nkedo alloy. Ferro-Vanadium alloys nke a na-emepụta na China bụ V401, V402, nwere 40% ọdịnaya nke Vanadium, nke a na-ejikarị eme ihe na nkedo ígwè, ma nwee ike imeziwanye ike, ike na iyi nguzogide na okpomọkụ dị elu.

Ngwa ahịa pụrụ iche bara ọgaranya bụ ọkachamara na nrụpụta nke Sputtering Target ma nwee ike mepụta Iron Vanadium sputtering Materials dị ka nkọwa ndị ahịa si dị. Maka ozi ndị ọzọ, biko kpọtụrụ anyị.


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