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Hafnium

Hafnium

Nkọwa dị mkpirikpi:

Otu Metal sputtering Target
Usoro ọgwụ Hf
Ihe mejupụtara Hafnium
Ịdị ọcha 99.9%,99.95%,99.99%
Ụdị Efere,Ebumnuche kọlụm,arc cathodes,Emebere nkeonwe
Usoro mmepụta Ịgbaze Vacuum,PM
Nha dị L≤2000mm,W≤200mm

Nkọwa ngwaahịa

Mkpado ngwaahịa

Hafnium nwere ọla ngbanwe ọla ọcha na-egbuke egbuke ma bụrụ nke na-adịghị mma. O nwere ọnụọgụ atọm nke 72 yana oke atomic nke 178.49. Ebe agbaze ya bụ 2227 ℃, ebe esi esi 4602 ℃ na njupụta nke 13.31g / cm³. Hafnium anaghị emeghachi omume na anaghị emeghachi omume na itule hydrochloric acid, itughari sulfuric acid na ike alkaline ngwọta, ma ọ bụ soluble na hydrofluoric acid na aqua regia.

Ebumnuche Hafnium sputtering nwere ike inye aka n'ịmepụta mkpuchi maka ngwa dị iche iche: ngwa anya, ihe mgbochi ihe nkiri dị mkpa, ọnụ ụzọ sekit jikọtara ọnụ na sensọ.

Ngwa ndị pụrụ iche bara ọgaranya bụ onye nrụpụta nke Sputtering Target ma nwee ike imepụta ihe dị ọcha Hafnium sputtering Materials dị ka nkọwa ndị ahịa si dị. Maka ozi ndị ọzọ, biko kpọtụrụ anyị.


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