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FeW sputtering Target High ịdị ọcha Ihe nkiri Pvd mkpuchi omenala emere

Tungsten ígwè

Nkọwa dị mkpirikpi:

Otu

Alloy Sputtering Target

Usoro ọgwụ

Ole na ole

Ihe mejupụtara

Tungsten ígwè

Ịdị ọcha

99.9%, 99.95%, 99.99%

Ụdị

Efere , Kọlụm Ezubere , arc cathodes , emebere ahaziri ahazi

Usoro mmepụta

Ịgbaze Vacuum, PM

Nha dị

L≤200mm, W≤200mm


Nkọwa ngwaahịa

Mkpado ngwaahịa

Tungsten alloy sputtering lekwasịrị anya nwere Tungsten ọdịnaya nke 70%-80%. A na-ejikarị ya eme ihe dị ka ihe mgbakwunye alloy na mmepụta ígwè. A na-ejikarị ya emepụta ngwá ọrụ ịkpụ, ogbunigwe, igwe rọketi na rocket nozzle nke na-arụ ọrụ maka gburugburu ebe okpomọkụ dị elu na ọsọ na-arụ ọrụ. E wezụga nke ahụ, a na-eji ígwè Tungsten alloy tinye ọtụtụ ihe ngwungwu ihe na mbepụ ngwá ọrụ, nke na-enye ha ike dị ka nke diamond.

Ngwa ndị pụrụ iche bara ọgaranya bụ ọkachamara na nrụpụta nke Sputtering Target ma nwee ike mepụta Iron Tungsten sputtering Materials dị ka nkọwa ndị ahịa si dị. Maka ozi ndị ọzọ, biko kpọtụrụ anyị.


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