N'ogbe FeCoTa Sputtering Target High Purity Thin Film Pvd mkpuchi Omenala Mere Manufacturer and Supplier

Iron Cobalt Tantalum

FeCoTa Sputtering Target High ịdị ọcha Ihe nkiri Pvd mkpuchi omenala emere onyonyo

Nkọwa dị mkpirikpi:

Otu	Alloy Sputtering Target
Usoro ọgwụ	FeCoTa
Ihe mejupụtara	Iron Cobalt Tantalum
Ịdị ọcha	99.9%, 99.95%, 99.99%
Ụdị	Efere , Kọlụm Ezubere , arc cathodes , emebere ahaziri ahazi
Usoro mmepụta	Ịgbaze Vacuum, PM
Nha dị	L≤200mm, W≤200mm

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Nkọwa ngwaahịa

Mkpado ngwaahịa

Ebumnuche Iron Cobalt Tantalum na-adịkarị n'ụdị okirikiri yana ihe nkiri dị mkpa dị mkpa nke mgbasa ozi magnetik kwụ ọtọ. Ọnụ ọgụgụ dị ukwuu nke Tantalum dị na alloy ga-eme ka nkewa dị iche iche na-eweta ihe ndị na-adịghị edozi. Anyị na-eji usoro mmepụta pụrụ iche nke nwere ike hụ na ịdị n'otu nke microstructure na-emeziwanye ihe eji arụ ọrụ.

Aha ngwaahịa		FeCoTa
Fe/wt%		Nhazi	Nhazi	Nhazi
Co/wt%		21.6 ± 0.5	21.9±0.5	20.2 ± 0.5
Ta/wt%		41.1 ± 0.8	39.4± 0.8	44.3 ± 0.8
Ọdịnaya adịghị ọcha ọla(ppm)	Ni	≤100	≤100	≤100
	Al	≤300	≤300	≤300
	Si	≤200	≤200	≤200
Ọdịnaya adịghị ọcha gas(ppm)	C	≤200	≤200	≤200
	N	≤100	≤100	≤100
	O	≤600	≤600	≤600
	S	≤75	≤75	≤75

Ngwa ahịa pụrụ iche bara ọgaranya bụ ọkachamara na nrụpụta nke Sputtering Target ma nwee ike mepụta Iron Cobalt Tantalum Sputtering Materials dị ka nkọwa ndị ahịa si dị. Maka ozi ndị ọzọ, biko kpọtụrụ anyị.

Nke gara aga: FeCo sputtering Target High ịdị ọcha Ihe nkiri Pvd mkpuchi omenala emere

Osote: FeSi sputtering Target High ịdị ọcha Ihe nkiri Pvd mkpuchi omenala emere