N'ogbe CrAl Alloy sputtering Target High ịdị ọcha Thin Film PVD mkpuchi Omenala Mere Manufacturer and Supplier

Aluminom chromium

CrAl Alloy sputtering Target High ịdị ọcha Ihe nkiri PVD mkpuchi omenala emere onyonyo.

Nkọwa dị mkpirikpi:

Otu	Alloy Sputtering Target
Usoro ọgwụ	CrAl
Ihe mejupụtara	Aluminom chromium
Ịdị ọcha	99.7%, 99.9%, 99.95%, 99.99%
Ụdị	Efere , Kọlụm Ezubere , arc cathodes , emebere ahaziri ahazi
Usoro mmepụta	Ịgbaze Vacuum, PM
Nha dị	L≤2000mm, W≤200mm

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Nkọwa ngwaahịa

Mkpado ngwaahịa

Mwepụta nke Chromium Aluminom Sputtering Targets nwere usoro ndị a:

1. Ntụ ntụ ntụ na ịgwakọta.

2. Hot isostatic ịpị ọgwụgwọ iji nweta ọkara emechara ngwaahịa.

3. Machining siri ike chromium aluminum alloy sputtering lekwasịrị ihe onwunwe iji nweta chromium aluminum alloy sputtering lekwasịrị anya ihe onwunwe.

N'oge usoro ntinye nke CrAl sputtering targets, a na-emepụta mkpuchi Aluminium-Chrom-Nitrid (AlCrN) siri ike. Ihe mkpuchi a na-egosi ihe siri ike na oxidation resistance Njirimara ọbụna na elu okpomọkụ. Ndị na-egbutu ahụ nwere ike na-agba ọsọ na nri dị elu iji mee ka arụpụta ọrụ dịkwuo elu ma bulie mma mgbe ị na-eji igwe CNC.

Ebumnuche AlCr anyị na akụrụngwa ha

	Cr-70 Alna%	Cr-60 Alna%	Cr-50 Alna%
Ịdị ọcha (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Njupụta(g/cm³)	3.7	4.35	4.55
Gmmiri ozuzo Nha(µm)	100/50	100/50	100/50
Usoro	HIP	HIP	HIP

Ngwa ahịa pụrụ iche bara ọgaranya bụ ọkachamara na nrụpụta nke Sputtering Target ma nwee ike imepụta ihe na-agbapụta Aluminom Chromium dịka nkọwapụta ndị ahịa si dị. Ngwaahịa anyị nwere ihe ndị dị mma n'ibu, ihe owuwu otu, elu a na-egbuke egbuke na-enweghị nkewa, pores ma ọ bụ cracks. Maka ozi ndị ọzọ, biko kpọtụrụ anyị.

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