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CoFeV Alloy sputtering Target High Purity Thin Film Pvd Coating Custom Mere

Cobalt Iron Vanadium

Nkọwa dị mkpirikpi:

Otu

Alloy Sputtering Target

Usoro ọgwụ

FeCoV

Ihe mejupụtara

Cobalt Iron Vanadium

Ịdị ọcha

99.9%, 99.95%, 99.99%

Ụdị

Efere , Kọlụm Ezubere , arc cathodes , emebere ahaziri ahazi

Usoro mmepụta

Ịgbaze Vacuum

Nha dị

L≤2000mm, W≤200mm


Nkọwa ngwaahịa

Mkpado ngwaahịa

Ebumnuche Cobalt Iron Vanadium sputtering nwere 52% ọdịnaya nke Cobalt, 9% -23% ọdịnaya nke Vanadium na ndị ọzọ - ductile na-adịgide adịgide-ihe ndọta. Ọ na-egosipụta ikike nrụrụ plastik mara mma ma enwere ike imepụta ya ka ọ bụrụ akụrụngwa nwere ụdị mgbagwoju anya.

Cobalt Iron Vanadium alloy sputtering lekwasịrị anya nwere oke saturation flux njupụta Bs (2.4T) na Curie okpomọkụ (980 ~ 1100 ℃). Ọ nwere ike inye aka na mbelata ibu ma nwee ike melite nkwụsi ike na okpomọkụ dị elu. Ọ bụ ihe kwesịrị ekwesị maka ngwa eletriki ụgbọ elu (obere igwe eletrik pụrụ iche, electromagnet na relay eletrik). Ọ nwekwara ọnụọgụ magnetostriction saturation dị elu, ma nwee ike imepụta transducer magnetostrictive.

Ngwa ndị pụrụ iche bara ọgaranya bụ ọkachamara na nrụpụta nke Sputtering Target ma nwee ike mepụta Cobalt Iron Vanadium Sputtering Materials dị ka nkọwa ndị ahịa si dị. Maka ozi ndị ọzọ, biko kpọtụrụ anyị.


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