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CoFeTaZr Alloy sputtering Target High ịdị ọcha mkpa ihe nkiri Pvd mkpuchi omenala emere

Cobalt Iron Tantalum Zirconium

Nkọwa dị mkpirikpi:

Otu

Alloy Sputtering Target

Usoro ọgwụ

CoFeTaZr

Ihe mejupụtara

Cobalt Iron Tantalum Zirconium

Ịdị ọcha

99.9%, 99.95%, 99.99%

Ụdị

Efere , Kọlụm Ezubere , arc cathodes , emebere ahaziri ahazi

Usoro mmepụta

Ịgbaze Vacuum

Nha dị

L≤200mm, W≤200mm


Nkọwa ngwaahịa

Mkpado ngwaahịa

Cobalt Iron Tantalum Zirconium na-agbaze ebumnobi bụ ihe eji agbaze oghere. Usoro mmepụta a nwere ike ichekwa ihe ndị bụ isi na oxidation nke ọma ma hụ na microstructure dị n'ụdị, nha ọka edo edo na nnukwu ihe nkiri ndị echekwara.

Mgbe ọgwụgwọ okpomọkụ gasịrị, PTF nke ebumnuche nwere ike ime ka ọ dịkwuo mma, ya mere a na-ejikarị ya eme ihe maka akwa akwa magnetik dị nro na ọkwa ndekọ magnetik perpendicular.

Ngwa ahịa pụrụ iche bara ọgaranya bụ ọkachamara na nrụpụta nke Sputtering Target ma nwee ike mepụta Cobalt Iron Tantalum Zirconium Sputtering Materials dị ka nkọwa ndị ahịa si dị. Maka ozi ndị ọzọ, biko kpọtụrụ anyị.


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