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AlTi alloy Sputtering Target High ịdị ọcha

Aluminium Titanium

Nkọwa dị mkpirikpi:

Otu

Alloy Sputtering Target

Usoro ọgwụ

AlTi

Ihe mejupụtara

Aluminium Titanium

Ịdị ọcha

99.9%, 99.95%, 99.99%

Ụdị

Efere , Kọlụm Ezubere , arc cathodes , emebere ahaziri ahazi

Usoro mmepụta

Ịgbaze Vacuum, PM

Nha dị

L≤2000mm, W≤200mm


Nkọwa ngwaahịa

Mkpado ngwaahịa

Ihe achọrọ nke ebumnuche ebumnuche maka mkpuchi sputter dị elu karịa nke ụlọ ọrụ ihe ọdịnala. Microstructure otu nke ebumnuche na-emetụta arụmọrụ sputtering ozugbo. Anyị nwere usoro njikwa mma zuru oke ma anyị na-ahọrọ akụrụngwa dị ọcha ma gwakọta ha nke ọma iji hụ na ịdị n'otu. A na-emepụta ebumnuche aluminom Titanium alloy sputtering site na iji usoro ịpị ọkụ ọkụ.

Ebumnuche anyị nke aluminom Titanium sputtering nwere ike inye mkpuchi nitride na-eguzogide oxidation pụtara ìhè, Titanium aluminum nitride (TiAlN). TiAlN bụ isi ihe dị ugbu a dị ka ihe nkiri maka ịkpụ ngwaọrụ, akụkụ slide na mkpuchi tribo. Ọ nwere nnukwu isi ike, ike siri ike, ịrụ ọrụ na-eguzogide ọgwụ na okpomọkụ oxidation.

Ebumnuche AlTi anyị na-ahụkarị na akụrụngwa ha

Ti-75Al na%

Ti-70Al na%

Ti-67Al na%

Ti-60Al na%

Ti-50Al na%

Ti-30Al na%

Ti-20Al na%

Ti-14Al na%

Ịdị ọcha (%)

99.7

99.7

99.7

99.7

99.8/99.9

99.9

99.9

99.9

Njupụta(g/cm3)

3.1

3.2

3.3

3.4

3.63/3.85

3.97

4.25

4.3

Gmmiri ozuzo Nha(µm)

100

100

100

100

100/-

-

-

-

Usoro

HIP

HIP

HIP

HIP

HIP/VAR

VAR

VAR

VAR

Ọgaranya ihe pụrụ iche pụrụ iche na nrụpụta nke Sputtering Target ma nwee ike imepụta ihe na-agbapụta Aluminom Titanium dị ka nkọwa ndị ahịa si dị. Anyị nwere ike ịnye ụdị ụdị geometric dị iche iche: tubes, arc cathodes, planar ma ọ bụ nke a na-eme omenala, yana oke nke Aluminom. Ngwaahịa anyị nwere ihe eji arụ ọrụ dị mma, microstructure dị n'otu, elu a na-egbuke egbuke na-enweghị nkewa, pores ma ọ bụ mgbawa. Maka ozi ndị ọzọ, biko kpọtụrụ anyị.


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