N'ogbe AlTa Sputtering Target High ịdị ọcha Thin Film PVD mkpuchi Omenala Mere Manufacturer and Supplier

Aluminom-Tantalum

AlTa Sputtering Target High ịdị ọcha Ihe nkiri PVD mkpuchi omenala emere onyonyo

Nkọwa dị mkpirikpi:

Otu	Alloy Sputtering Target
Usoro ọgwụ	AlTa
Ihe mejupụtara	Aluminom-Tantalum
Ịdị ọcha	99.9%, 99.95%, 99.99%
Ụdị	Efere , Kọlụm Ezubere , arc cathodes , emebere ahaziri ahazi
Usoro mmepụta	Ịgbaze Vacuum, PM
Nha dị	L≤200mm, W≤200mm

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Nkọwa ngwaahịa

Mkpado ngwaahịa

A na-akwado ebumnuche ndị a site na ịgwakọta ntụ ntụ Aluminom na Tantalum ma ọ bụ ịgbaze oghere na-esote compaction na njupụta zuru oke. A na-agbakọta ihe ndị a jikọtara ọnụ na nhọrọ wee kpụzie ya ka ọ bụrụ ọdịdị ebumnuche achọrọ.

Aluminom Tantalum sputtering lekwasịrị anya nwere ịdị ọcha dị elu, microstructure na-arụkọ ọrụ ọnụ na arụmọrụ dị mma. A na-ejikarị ya eme ihe na-emepụta ihe nkiri dị mkpa maka ụlọ ọrụ ngosi panel panel. Aluminum Tantalum nwekwara ike ịgbakwunye iji mepụta Titanium alloy na-arụ ọrụ dị elu iji melite ogo ya dị elu.

Ọdịnaya adịghị ọcha nke Al-Ta alloy

mejupụtara	Ọdịnaya(%)
	Ta	Fe	Si	C	O
AlTa60	55.0-65.0	≤0.05	≤0.02	≤0.01	≤0.05
AlTa70	65.0-75.0	≤0.05	≤0.02	≤0.01	≤0.05

Ihe ndị pụrụ iche bara ọgaranya bụ ọkachamara na nrụpụta nke Sputtering Target ma nwee ike ịmepụta Aluminom Tantalum Sputtering Materials dị ka nkọwa ndị ahịa si dị. Ngwaahịa anyị nwere ihe ndị dị mma n'ibu, ihe owuwu otu, elu a na-egbuke egbuke na-enweghị nkewa, pores ma ọ bụ cracks. Maka ozi ndị ọzọ, biko kpọtụrụ anyị.

Nke gara aga: AlTi alloy Sputtering Target High ịdị ọcha

Osote: AlCu Sputtering Target High ịdị ọcha Ihe nkiri PVD mkpuchi omenala emere