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AlCu Sputtering Target High ịdị ọcha Ihe nkiri PVD mkpuchi omenala emere

Aluminom ọla kọpa

Nkọwa dị mkpirikpi:

Otu

Alloy Sputtering Target

Usoro ọgwụ

AlCu

Ihe mejupụtara

Aluminom ọla kọpa

Ịdị ọcha

99.9%, 99.95%, 99.99%

Ụdị

Efere , Kọlụm Ezubere , arc cathodes , emebere ahaziri ahazi

Usoro mmepụta

Ịgbaze Vacuum, PM

Nha dị

L≤200mm, W≤200mm


Nkọwa ngwaahịa

Mkpado ngwaahịa

Aluminom ọla kọpa sputtering ebumnuche zuru oke maka ọtụtụ ụlọ ọrụ na ngwa, n'ihi ịdị elu ya siri ike, ike ike na ịdị arọ. Ọ na-enwekarị ọdịnaya ọla kọpa 1-3% ma nwee ihe ndị yiri ya na aluminom. AlCu nwere ihe eji arụ ọrụ dị elu, nrụpụta ọrụ dị mma, yana oke okpomọkụ kwesịrị ekwesị, yabụ na ọ nwere ike bụrụ ihe dabara adaba maka arụmọrụ Aluminom alloy dị elu. Enwere ike iji ebumnuche ịgbasa AlCu dị elu dị elu n'ọtụtụ ebe mmepụta ihe sitere na semiconductor na ngwa eletrọnịkị na-arụ ọrụ.

Ngwa ahịa pụrụ iche bara ọgaranya bụ ọkachamara na nrụpụta nke Sputtering Target ma nwee ike imepụta ihe na-agbapụta Aluminom Chromium dịka nkọwapụta ndị ahịa si dị. Ngwaahịa anyị nwere ihe ndị dị mma n'ibu, ihe owuwu otu, elu a na-egbu maramara na-enweghị nkewa, pores, ma ọ bụ mgbape. Maka ozi ndị ọzọ, biko kpọtụrụ anyị.


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