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Hot Sale for China Spray Target Nbox Nb2o5 Sputter Target Rotatable High Purity 99.95% Target Sial Znal Znsn Nicr Azo ITO

Chrome Aluminum Silicon

Short Description:

Category

Alloy Sputtering Target

Chemical Formula

CrAlSi

Composition

Chrome aluminum silicon

Purity

99.9%,99.95%,99.99%

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting,PM

Available Size

L≤1000mm,W≤200mm


Product Detail

Product Tags

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We’re convinced that with joint initiatives, the business between us will bring us mutual benefits. We can easily guarantee you merchandise good quality and competitive rate for China Cylindrical Nbo Target Tube Cathode, PVD Coating Material Target, During the development, our company has built a well-known brand. It is well highly acclaimed by our customers. OEM and ODM are accepted. We are looking forward to customers from all over the world to join us to a wild cooperation.

Chronium Aluminum Silicon Sputtering Target Description

The fabrication of Chronium Aluminum Silicon Sputtering Targets comprises the following steps:
1.Vacuum melting of Silicon, Aluminum and Chronium to obtain step alloys.
2.Powder grinding and mixing.
3.Hot isostatic pressing treatment to obtain the chromium Aluminum silicon alloy sputtering target.
Chronium Aluminum Silicon Sputtering Targets are extensively used in cutting tools and molds, owing to its wear resistance and high temperature oxidation resistance to improve the film performance.
An amorphous Si3N4 phase would be formed during the process of PVD of CrAlSi targets. Due to the incorporation of amorphous Si3N4 phase, the growth of the grain size could be restrained and improve the high temperature oxidation resistance property.

Chronium Aluminum Silicon Sputtering Target Packaging

Our Chronium Aluminum Silicon sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation

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RSM’s Chronium Aluminum Silicon sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.We’re convinced that with joint initiatives, the business between us will bring us mutual benefits. We can easily guarantee you merchandise good quality and competitive rate for Hot Sale for China Spray Target Nbox Nb2o5 Sputter Target Rotatable High Purity 99.95% Hip CIP Target Export Vicky-Chan@Uvtm. COM Sial Znal Znsn Nicr Azo ITO, Welcome to go to us at any time for company romance established.
Hot Sale for China Cylindrical Nbo Target Tube Cathode, PVD Coating Material Target, During the development, our company has built a well-known brand. It is well highly acclaimed by our customers. OEM and ODM are accepted. We are looking forward to customers from all over the world to join us to a wild cooperation.


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