Ntau tus neeg siv yuav tsum tau hnov txog cov khoom ntawm sputtering lub hom phiaj, tab sis lub hauv paus ntsiab lus ntawm sputtering lub hom phiaj yuav tsum tsis paub. Tam sim no, tus editor ntawmCov khoom siv tshwj xeeb nplua nuj (RSM) qhia txog magnetron sputtering cov hauv paus ntsiab lus ntawm sputtering phiaj.
Ib qho orthogonal magnetic teb thiab hluav taws xob teb yog ntxiv ntawm sputtered lub hom phiaj electrode (cathode) thiab cov anode, qhov yuav tsum tau inert gas (feem ntau Ar gas) tau ntim rau hauv lub tshuab nqus tsev siab chamber, cov hlau nplaum tas mus li tsim 250 ~ 350 Gauss magnetic teb ntawm qhov chaw ntawm lub hom phiaj cov ntaub ntawv, thiab lub orthogonal electromagnetic teb yog tsim nrog high-voltage hluav taws xob teb.
Nyob rau hauv cov nyhuv ntawm hluav taws xob teb, Ar gas yog ionized rau hauv zoo ions thiab electrons. Ib qho tsis zoo siab voltage ntxiv rau lub hom phiaj. Cov nyhuv ntawm magnetic teb ntawm electrons tawm ntawm lub hom phiaj ncej thiab ionization tshwm sim ntawm kev ua hauj lwm roj nce, tsim ib tug high-density plasma nyob ze ntawm lub cathode. Raws li cov txiaj ntsig ntawm Lorentz quab yuam, Ar ions nrawm mus rau lub hom phiaj nto thiab foob pob rau lub hom phiaj ntawm qhov kub ceev, Lub sputtered atoms ntawm lub hom phiaj ua raws li lub zog hloov dua siab tshiab thiab ya tawm ntawm lub hom phiaj nto mus rau lub substrate nrog lub zog kinetic siab. tso nyiaj ua movie.
Magnetron sputtering feem ntau muab faib ua ob hom: Tributary sputtering thiab RF sputtering. Lub hauv paus ntsiab lus ntawm tributary sputtering khoom yog yooj yim, thiab nws tus nqi kuj yog ceev thaum sputtering hlau. RF sputtering yog dav siv. Ntxiv nrog rau sputtering conductive cov ntaub ntawv, nws tseem tuaj yeem sputter cov ntaub ntawv tsis-conductive. Nyob rau tib lub sijhawm, nws kuj tseem ua reactive sputtering los npaj cov ntaub ntawv ntawm oxides, nitrides, carbides thiab lwm cov tebchaw. Yog tias RF zaus nce, nws yuav dhau los ua microwave plasma sputtering. Tam sim no, electron cyclotron resonance (ECR) microwave plasma sputtering feem ntau yog siv.
Post lub sij hawm: May-31-2022