Txais tos rau peb lub vev xaib!

FeCoTa Sputtering Target High Purity Thin Film Pvd Txheej Custom Made

Hlau Cobalt Tantalum

Lus piav qhia luv luv:

Qeb

Alloy Sputtering Target

Tshuaj Formula

FeCoTa

Kev sib xyaw

Hlau Cobalt Tantalum

Purity

99.9%, 99.95%, 99.99%

Cov duab

Phaj, Kem Hom Phiaj, arc cathodes, Custom-made

Txheej txheem ntau lawm

Nqus Melting, PM

Muaj Qhov Loj

L≤200mm, W≤200mm


Product Detail

Khoom cim npe

Iron Cobalt Tantalum lub hom phiaj feem ntau muaj nyob rau hauv cov duab thiab cov ntaub ntawv tseem ceeb ntawm cov ntaub ntawv ntawm cov ntaub ntawv sib nqus sib nqus. Qhov ntau ntawm Tantalum tam sim no nyob rau hauv cov hlau yuav ua rau muaj kev sib cais thiab tam sim no undissolved hais. Peb siv cov txheej txheem tsim tshwj xeeb uas tuaj yeem ua kom lub homogeneity ntawm microstructure thiab txhim kho cov khoom siv ntawm cov khoom siv.

Khoom npe

FeCoTa

Fe/wt%

Tshuav

Tshuav

Tshuav

Co/wt%

21.6 ± 0.5

21.9 ± 0.5

20.2 ± 0.5

Tau / wt%

41.1 ± 0.8

39.4 ± 0.8

44.3 ± 0.8

Cov ntsiab lus hlau impurity(ppm)

Ni

≤100

≤100

≤100

Al

≤300

≤300

≤300

Si

≤200

≤200

≤200

Gas impurity cov ntsiab lus(ppm)

C

≤200

≤200

≤200

N

≤100

≤100

≤100

O

≤600

≤600

≤600

S

≤75

≤75

≤75

Cov Khoom Muag Khoom Tshwj Xeeb Tshwj Xeeb tshwj xeeb hauv Kev Tsim Khoom ntawm Sputtering Target thiab tuaj yeem tsim Iron Cobalt Tantalum Sputtering Materials raws li cov neeg siv khoom tshwj xeeb. Yog xav paub ntxiv, thov hu rau peb.


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