FeCoTa Sputtering Target High Purity Thin Film Pvd Txheej Custom Made
Hlau Cobalt Tantalum
Iron Cobalt Tantalum lub hom phiaj feem ntau muaj nyob rau hauv cov duab thiab cov ntaub ntawv tseem ceeb ntawm cov ntaub ntawv ntawm cov ntaub ntawv sib nqus sib nqus. Qhov ntau ntawm Tantalum tam sim no nyob rau hauv cov hlau yuav ua rau muaj kev sib cais thiab tam sim no undissolved hais. Peb siv cov txheej txheem tsim tshwj xeeb uas tuaj yeem ua kom lub homogeneity ntawm microstructure thiab txhim kho cov khoom siv ntawm cov khoom siv.
Khoom npe | FeCoTa | |||
Fe/wt% | Tshuav | Tshuav | Tshuav | |
Co/wt% | 21.6 ± 0.5 | 21.9 ± 0.5 | 20.2 ± 0.5 | |
Tau / wt% | 41.1 ± 0.8 | 39.4 ± 0.8 | 44.3 ± 0.8 | |
Cov ntsiab lus hlau impurity(ppm) | Ni | ≤100 | ≤100 | ≤100 |
Al | ≤300 | ≤300 | ≤300 | |
Si | ≤200 | ≤200 | ≤200 | |
Gas impurity cov ntsiab lus(ppm) | C | ≤200 | ≤200 | ≤200 |
N | ≤100 | ≤100 | ≤100 | |
O | ≤600 | ≤600 | ≤600 | |
S | ≤75 | ≤75 | ≤75 |
Cov Khoom Muag Khoom Tshwj Xeeb Tshwj Xeeb tshwj xeeb hauv Kev Tsim Khoom ntawm Sputtering Target thiab tuaj yeem tsim Iron Cobalt Tantalum Sputtering Materials raws li cov neeg siv khoom tshwj xeeb. Yog xav paub ntxiv, thov hu rau peb.