Lag luam wholesale CrAl Alloy Sputtering Target High Purity nyias zaj duab xis PVD txheej Custom Made Chaw tsim tshuaj paus thiab tsum

Chromium Aluminium

CrAl Alloy Sputtering Target High Purity nyias zaj duab xis PVD txheej Custom Made Featured duab

Lus piav qhia luv luv:

Qeb	Alloy Sputtering Target
Tshuaj Formula	CrAl
Kev sib xyaw	Chromium Aluminium
Purity	99.7%, 99.9%, 99.95%, 99.99%
Cov duab	Phaj, Kem Hom Phiaj, arc cathodes, Custom-made
Txheej txheem ntau lawm	Nqus Melting, PM
Muaj Qhov Loj	L≤2000mm, W≤200mm

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Product Detail

Khoom cim npe

Kev tsim ntawm Chromium Aluminium Sputtering Targets suav nrog cov kauj ruam hauv qab no:

1. hmoov sib tsoo thiab sib tov.

2. Kub isostatic nias kho kom tau txais cov khoom tiav.

3. Machining cov ntxhib chromium aluminium alloy sputtering lub hom phiaj cov khoom kom tau txais cov chromium aluminium alloy sputtering phiaj cov khoom.

Thaum lub sij hawm deposition txheej txheem ntawm CrAl sputtering lub hom phiaj, ib tug nyuaj Aluminium-Chrom-Nitrid (AlCrN) txheej yog tsim. Cov txheej no qhia tau hais tias muaj zog hardness thiab oxidation tsis kam txawm nyob rau qhov kub thiab txias. Cov cutters tuaj yeem khiav ntawm cov khoom noj siab kom ua tau zoo thiab nce qhov zoo thaum siv cov tshuab CNC.

Peb cov hom phiaj AlCr thiab lawv cov khoom

	Cr-70 Alntawm%	Cr-60 Alntawm%	Cr-50 Alntawm%
Purity (%)	99.8 / 99.9 / 99.95	99.8 / 99.9 / 99.95	99.8 / 99.9 / 99.95
Qhov ntom(g/cm³)	3.7	4.35	4.55 ib
Gnag Loj(µm)	100/50	100/50	100/50
Txheej txheem	HIP	HIP	HIP

Cov khoom siv nplua nuj tshwj xeeb tshwj xeeb hauv kev tsim cov Sputtering Target thiab tuaj yeem tsim Aluminium Chromium Sputtering Materials raws li cov neeg siv khoom tshwj xeeb. Peb cov khoom muaj cov khoom siv zoo heev, homogeneous qauv, polished nto tsis muaj kev sib cais, pores lossis tawg. Yog xav paub ntxiv, thov hu rau peb.

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